Experimental investigation of the channel network formed by high-dose He implantation

A. Manuaba, F. Paszti, E. Kotai

Research output: Contribution to journalArticle


A buried 5 μm thick He depth distribution plateau was implanted into Al at RT together with two well separated mono-energetic peaks on it as markers. The variation of implanted profile versus implanted dose was measured in-situ by 3500 keV RBS, confirming that even at the onset of exfoliation (8.33 × 1018 He/cm2) there was no channel network interconnecting all of the implanted depth region. During further bombardment, together with the appearance of surface deformation, more and more He originating from large cracks under the detached layer were released through the cracks and ruptures of the cover. The cracks resulting from the surface deformation appeared at the two separated maxima of the He depth profile.

Original languageEnglish
Pages (from-to)163-169
Number of pages7
JournalJournal of Nuclear Materials
Issue number3
Publication statusPublished - Jan 1 1990

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Materials Science(all)
  • Nuclear Energy and Engineering

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