Excimer laser reactive deposition of vanadium nitride thin films

E. D'Anna, A. Di Cristoforo, M. Fernández, G. Leggieri, A. Luches, G. Majni, P. Mengucci, L. Nanai

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We report on the deposition of thin vanadium nitride films by ablating vanadium targets in low-pressure N2 atmosphere, and on their characterization. The targets were vanadium foils (purity 99.8%). 3in. Si(1 1 1) wafers were used as substrates. Film characteristics (composition and crystalline structure) were studied as a function of N2 pressure (0.5-200 Pa), KrF laser fluence (4.5-19 J/cm2), substrate temperature (20-750°C) and target-to-substrate distance (30-70mm). Vanadium nitride is already formed at low N2 ambient pressures (1 Pa) and laser fluences (6 J/cm2) on substrates at room temperature. At the N2 pressures of 1-10 Pa, the prevalent phase is VN. At higher pressures (100 Pa) and at relatively high laser fluences (16-19 J/cm2), the dominant phase is V2N. The crystallinity of the films improves by increasing the substrate temperature. Well-crystallized films are obtained on substrates heated at 500 °C.

Original languageEnglish
Pages (from-to)496-501
Number of pages6
JournalApplied Surface Science
Volume186
Issue number1-4
DOIs
Publication statusPublished - Jan 28 2002

Fingerprint

Vanadium
Excimer lasers
Nitrides
excimer lasers
vanadium
nitrides
Thin films
Substrates
thin films
fluence
Lasers
lasers
Temperature
Metal foil
foils
crystallinity
purity
low pressure
wafers
Crystalline materials

Keywords

  • Laser ablation
  • Reactive laser ablation
  • Vanadium nitride

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

D'Anna, E., Di Cristoforo, A., Fernández, M., Leggieri, G., Luches, A., Majni, G., ... Nanai, L. (2002). Excimer laser reactive deposition of vanadium nitride thin films. Applied Surface Science, 186(1-4), 496-501. https://doi.org/10.1016/S0169-4332(01)00757-7

Excimer laser reactive deposition of vanadium nitride thin films. / D'Anna, E.; Di Cristoforo, A.; Fernández, M.; Leggieri, G.; Luches, A.; Majni, G.; Mengucci, P.; Nanai, L.

In: Applied Surface Science, Vol. 186, No. 1-4, 28.01.2002, p. 496-501.

Research output: Contribution to journalArticle

D'Anna, E, Di Cristoforo, A, Fernández, M, Leggieri, G, Luches, A, Majni, G, Mengucci, P & Nanai, L 2002, 'Excimer laser reactive deposition of vanadium nitride thin films', Applied Surface Science, vol. 186, no. 1-4, pp. 496-501. https://doi.org/10.1016/S0169-4332(01)00757-7
D'Anna E, Di Cristoforo A, Fernández M, Leggieri G, Luches A, Majni G et al. Excimer laser reactive deposition of vanadium nitride thin films. Applied Surface Science. 2002 Jan 28;186(1-4):496-501. https://doi.org/10.1016/S0169-4332(01)00757-7
D'Anna, E. ; Di Cristoforo, A. ; Fernández, M. ; Leggieri, G. ; Luches, A. ; Majni, G. ; Mengucci, P. ; Nanai, L. / Excimer laser reactive deposition of vanadium nitride thin films. In: Applied Surface Science. 2002 ; Vol. 186, No. 1-4. pp. 496-501.
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