Evaluation of different strategies for quantitative depth profile analysis of Cu/NiCu layers and multilayers via pulsed glow discharge – Time of flight mass spectrometry

Rocío Muñiz, Lara Lobo, Katalin Németh, L. Péter, Rosario Pereiro

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

There is still a lack of approaches for quantitative depth-profiling when dealing with glow discharges (GD) coupled to mass spectrometric detection. The purpose of this work is to develop quantification procedures using pulsed GD (PGD) - time of flight mass spectrometry. In particular, research was focused towards the depth profile analysis of Cu/NiCu nanolayers and multilayers electrodeposited on Si wafers. PGDs are characterized by three different regions due to the temporal application of power: prepeak, plateau and afterglow. This last region is the most sensitive and so it is convenient for quantitative analysis of minor components; however, major elements are often saturated, even at 30 W of applied radiofrequency power for these particular samples. For such cases, we have investigated two strategies based on a multimatrix calibration procedure: (i) using the afterglow region for all the sample components except for the major element (Cu) that was analyzed in the plateau, and (ii) using the afterglow region for all the elements measuring the ArCu signal instead of Cu. Seven homogeneous certified reference materials containing Si, Cr, Fe, Co, Ni and Cu have been used for quantification. Quantitative depth profiles obtained with these two strategies for samples containing 3 or 6 multilayers (of a few tens of nanometers each layer) were in agreement with the expected values, both in terms of thickness and composition of the layers.

Original languageEnglish
Pages (from-to)34-41
Number of pages8
JournalSpectrochimica Acta - Part B Atomic Spectroscopy
Volume135
DOIs
Publication statusPublished - Sep 1 2017

Fingerprint

Glow discharges
afterglows
glow discharges
Mass spectrometry
Multilayers
mass spectroscopy
Prostaglandins D
Depth profiling
evaluation
plateaus
profiles
Chemical analysis
Calibration
quantitative analysis
wafers

Keywords

  • Electrodeposited multilayers
  • Elemental depth profile analysis
  • Glow discharge
  • Quantitative depth profile analysis
  • Time of flight mass spectrometry

ASJC Scopus subject areas

  • Analytical Chemistry
  • Atomic and Molecular Physics, and Optics
  • Instrumentation
  • Spectroscopy

Cite this

Evaluation of different strategies for quantitative depth profile analysis of Cu/NiCu layers and multilayers via pulsed glow discharge – Time of flight mass spectrometry. / Muñiz, Rocío; Lobo, Lara; Németh, Katalin; Péter, L.; Pereiro, Rosario.

In: Spectrochimica Acta - Part B Atomic Spectroscopy, Vol. 135, 01.09.2017, p. 34-41.

Research output: Contribution to journalArticle

@article{763a2ac8ed2b4e02bbac3c812cb178db,
title = "Evaluation of different strategies for quantitative depth profile analysis of Cu/NiCu layers and multilayers via pulsed glow discharge – Time of flight mass spectrometry",
abstract = "There is still a lack of approaches for quantitative depth-profiling when dealing with glow discharges (GD) coupled to mass spectrometric detection. The purpose of this work is to develop quantification procedures using pulsed GD (PGD) - time of flight mass spectrometry. In particular, research was focused towards the depth profile analysis of Cu/NiCu nanolayers and multilayers electrodeposited on Si wafers. PGDs are characterized by three different regions due to the temporal application of power: prepeak, plateau and afterglow. This last region is the most sensitive and so it is convenient for quantitative analysis of minor components; however, major elements are often saturated, even at 30 W of applied radiofrequency power for these particular samples. For such cases, we have investigated two strategies based on a multimatrix calibration procedure: (i) using the afterglow region for all the sample components except for the major element (Cu) that was analyzed in the plateau, and (ii) using the afterglow region for all the elements measuring the ArCu signal instead of Cu. Seven homogeneous certified reference materials containing Si, Cr, Fe, Co, Ni and Cu have been used for quantification. Quantitative depth profiles obtained with these two strategies for samples containing 3 or 6 multilayers (of a few tens of nanometers each layer) were in agreement with the expected values, both in terms of thickness and composition of the layers.",
keywords = "Electrodeposited multilayers, Elemental depth profile analysis, Glow discharge, Quantitative depth profile analysis, Time of flight mass spectrometry",
author = "Roc{\'i}o Mu{\~n}iz and Lara Lobo and Katalin N{\'e}meth and L. P{\'e}ter and Rosario Pereiro",
year = "2017",
month = "9",
day = "1",
doi = "10.1016/j.sab.2017.06.016",
language = "English",
volume = "135",
pages = "34--41",
journal = "Spectrochimica Acta, Part B: Atomic Spectroscopy",
issn = "0584-8547",
publisher = "Elsevier",

}

TY - JOUR

T1 - Evaluation of different strategies for quantitative depth profile analysis of Cu/NiCu layers and multilayers via pulsed glow discharge – Time of flight mass spectrometry

AU - Muñiz, Rocío

AU - Lobo, Lara

AU - Németh, Katalin

AU - Péter, L.

AU - Pereiro, Rosario

PY - 2017/9/1

Y1 - 2017/9/1

N2 - There is still a lack of approaches for quantitative depth-profiling when dealing with glow discharges (GD) coupled to mass spectrometric detection. The purpose of this work is to develop quantification procedures using pulsed GD (PGD) - time of flight mass spectrometry. In particular, research was focused towards the depth profile analysis of Cu/NiCu nanolayers and multilayers electrodeposited on Si wafers. PGDs are characterized by three different regions due to the temporal application of power: prepeak, plateau and afterglow. This last region is the most sensitive and so it is convenient for quantitative analysis of minor components; however, major elements are often saturated, even at 30 W of applied radiofrequency power for these particular samples. For such cases, we have investigated two strategies based on a multimatrix calibration procedure: (i) using the afterglow region for all the sample components except for the major element (Cu) that was analyzed in the plateau, and (ii) using the afterglow region for all the elements measuring the ArCu signal instead of Cu. Seven homogeneous certified reference materials containing Si, Cr, Fe, Co, Ni and Cu have been used for quantification. Quantitative depth profiles obtained with these two strategies for samples containing 3 or 6 multilayers (of a few tens of nanometers each layer) were in agreement with the expected values, both in terms of thickness and composition of the layers.

AB - There is still a lack of approaches for quantitative depth-profiling when dealing with glow discharges (GD) coupled to mass spectrometric detection. The purpose of this work is to develop quantification procedures using pulsed GD (PGD) - time of flight mass spectrometry. In particular, research was focused towards the depth profile analysis of Cu/NiCu nanolayers and multilayers electrodeposited on Si wafers. PGDs are characterized by three different regions due to the temporal application of power: prepeak, plateau and afterglow. This last region is the most sensitive and so it is convenient for quantitative analysis of minor components; however, major elements are often saturated, even at 30 W of applied radiofrequency power for these particular samples. For such cases, we have investigated two strategies based on a multimatrix calibration procedure: (i) using the afterglow region for all the sample components except for the major element (Cu) that was analyzed in the plateau, and (ii) using the afterglow region for all the elements measuring the ArCu signal instead of Cu. Seven homogeneous certified reference materials containing Si, Cr, Fe, Co, Ni and Cu have been used for quantification. Quantitative depth profiles obtained with these two strategies for samples containing 3 or 6 multilayers (of a few tens of nanometers each layer) were in agreement with the expected values, both in terms of thickness and composition of the layers.

KW - Electrodeposited multilayers

KW - Elemental depth profile analysis

KW - Glow discharge

KW - Quantitative depth profile analysis

KW - Time of flight mass spectrometry

UR - http://www.scopus.com/inward/record.url?scp=85021659282&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85021659282&partnerID=8YFLogxK

U2 - 10.1016/j.sab.2017.06.016

DO - 10.1016/j.sab.2017.06.016

M3 - Article

AN - SCOPUS:85021659282

VL - 135

SP - 34

EP - 41

JO - Spectrochimica Acta, Part B: Atomic Spectroscopy

JF - Spectrochimica Acta, Part B: Atomic Spectroscopy

SN - 0584-8547

ER -