Erratum: The mechanism of defect creation and passivation at the SiC/SiO2 interface (Journal of Physics D: Applied Physics (2007) 40 (6242-6253))

Peter Deák, Jan Knaup, Christoph Thill, Thomas Frauenheim, Tamás Hornos, Adam Gali

Research output: Contribution to journalComment/debate

5 Citations (Scopus)
Original languageEnglish
Article number049801
JournalJournal of Physics D: Applied Physics
Volume41
Issue number4
DOIs
Publication statusPublished - Feb 13 2008

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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