Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique

Miklós Erdélyi, Z. Bor, William L. Wilson, Michael C. Smayling, Frank K. Tittel

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

A coherent multiple imaging technique for use in optical microlithography was studied. The technique involves placing a thin Fabry-Perot etalon between the mask and the projection lens of an optical stepper. An optical lithographic computer simulation tool, Prolith/2, was used to evaluate the aerial image profile obtained for extended mask structures such as typical contact hole arrays and line-space patterns used in integrated circuit fabrication. Additionally, a set of experimental studies were performed to validate the simulation results. Enhancement of both resolution and depth of focus can be obtained simultaneously with appropriate etalon parameters.

Original languageEnglish
Pages (from-to)1121-1129
Number of pages9
JournalApplied Optics
Volume39
Issue number7
Publication statusPublished - Mar 1 2000

Fingerprint

spatial filtering
Lithography
Masks
masks
optical computers
Optical resolving power
imaging techniques
integrated circuits
Integrated circuits
electric contacts
Lenses
computerized simulation
projection
lenses
Antennas
Imaging techniques
Fabrication
fabrication
augmentation
Computer simulation

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Erdélyi, M., Bor, Z., Wilson, W. L., Smayling, M. C., & Tittel, F. K. (2000). Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique. Applied Optics, 39(7), 1121-1129.

Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique. / Erdélyi, Miklós; Bor, Z.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K.

In: Applied Optics, Vol. 39, No. 7, 01.03.2000, p. 1121-1129.

Research output: Contribution to journalArticle

Erdélyi, M, Bor, Z, Wilson, WL, Smayling, MC & Tittel, FK 2000, 'Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique', Applied Optics, vol. 39, no. 7, pp. 1121-1129.
Erdélyi M, Bor Z, Wilson WL, Smayling MC, Tittel FK. Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique. Applied Optics. 2000 Mar 1;39(7):1121-1129.
Erdélyi, Miklós ; Bor, Z. ; Wilson, William L. ; Smayling, Michael C. ; Tittel, Frank K. / Enhanced optical microlithography with a Fabry-Perot-based spatial filtering technique. In: Applied Optics. 2000 ; Vol. 39, No. 7. pp. 1121-1129.
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