Enhanced microlithography using coherent multiple imaging

Miklos Erdelyi, K. Osvay, Z. Bor, William L. Wilson, Michael C. Smayling, Frank K. Tittel

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)

Abstract

An experimental and theoretical study of a coherent multiple imaging technique (CMI) that utilizes a Fabry-Perot etalon placed between the photo mask and the projection lens is reported. This technique can enhance both resolution and depth of focus in optical microlithography. A lithography simulation tool, Prolith/2, was used to evaluate the aerial image profile using a complex phase-amplitude pupil-plane filter to simulate the effect of the Fabry-Perot etalon. This work specifically discusses the evaluation of extended periodic patterns (line/space patterns and contact hole arrays), widely used in lithographic simulations. Simulation results are described and compared with experimental data. The impact of Talbot images generated by periodic structures is also described.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages180-188
Number of pages9
Volume3741
Publication statusPublished - 1999
EventProceedings of the 1999 Lithography for Semiconductor Manufacturing - Edinburgh, UK
Duration: May 19 1999May 21 1999

Other

OtherProceedings of the 1999 Lithography for Semiconductor Manufacturing
CityEdinburgh, UK
Period5/19/995/21/99

Fingerprint

Lithography
Imaging techniques
Periodic structures
Optical resolving power
Masks
Lenses
simulation
pupils
Antennas
imaging techniques
electric contacts
masks
lithography
projection
lenses
filters
evaluation
profiles

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Erdelyi, M., Osvay, K., Bor, Z., Wilson, W. L., Smayling, M. C., & Tittel, F. K. (1999). Enhanced microlithography using coherent multiple imaging. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3741, pp. 180-188). Society of Photo-Optical Instrumentation Engineers.

Enhanced microlithography using coherent multiple imaging. / Erdelyi, Miklos; Osvay, K.; Bor, Z.; Wilson, William L.; Smayling, Michael C.; Tittel, Frank K.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3741 Society of Photo-Optical Instrumentation Engineers, 1999. p. 180-188.

Research output: Chapter in Book/Report/Conference proceedingChapter

Erdelyi, M, Osvay, K, Bor, Z, Wilson, WL, Smayling, MC & Tittel, FK 1999, Enhanced microlithography using coherent multiple imaging. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 3741, Society of Photo-Optical Instrumentation Engineers, pp. 180-188, Proceedings of the 1999 Lithography for Semiconductor Manufacturing, Edinburgh, UK, 5/19/99.
Erdelyi M, Osvay K, Bor Z, Wilson WL, Smayling MC, Tittel FK. Enhanced microlithography using coherent multiple imaging. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3741. Society of Photo-Optical Instrumentation Engineers. 1999. p. 180-188
Erdelyi, Miklos ; Osvay, K. ; Bor, Z. ; Wilson, William L. ; Smayling, Michael C. ; Tittel, Frank K. / Enhanced microlithography using coherent multiple imaging. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3741 Society of Photo-Optical Instrumentation Engineers, 1999. pp. 180-188
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