Enhanced microlithography using coherent multiple imaging

Miklos Erdelyi, Karoly Osvay, Zsolt Bor, William L. Wilson, Michael C. Smayling, Frank K. Tittel

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

An experimental and theoretical study of a coherent multiple imaging technique (CMI) that utilizes a Fabry-Perot etalon placed between the photo mask and the projection lens is reported. This technique can enhance both resolution and depth of focus in optical microlithography. A lithography simulation tool, Prolith/2, was used to evaluate the aerial image profile using a complex phase-amplitude pupil-plane filter to simulate the effect of the Fabry-Perot etalon. This work specifically discusses the evaluation of extended periodic patterns (line/space patterns and contact hole arrays), widely used in lithographic simulations. Simulation results are described and compared with experimental data. The impact of Talbot images generated by periodic structures is also described.

Original languageEnglish
Pages (from-to)180-188
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3741
Publication statusPublished - Jan 1 1999
EventProceedings of the 1999 Lithography for Semiconductor Manufacturing - Edinburgh, UK
Duration: May 19 1999May 21 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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