Engineering tool set for monolithic and hybrid microsystem design

H. Boutamine, J. M. Karam, B. Courtois, P. Drake, J. Oudinot, H. E.L. Tahawi, M. Rencz, A. Popped, V. Szekely

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

In this paper, we report on the recent advances in building an integrated environment for the design and simulation of microsystems based on commercially available CAD tools. The environment allows a continuous design flow from front-end to back-end for both monolithic and hybrid microsystems. Based on the FEM simulation results in a pre-design phase, simulation models of available standard components are developed in a system level and coupled to layout generators. A multi-level, mixed-mode, multi-Technology simulation is ensured and a schematic driven layout is generated. Tools for anisotropic etching simulation are integrated in order to predict the etching procedure of full-custom microstructures.

Original languageEnglish
Pages (from-to)76-84
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3225
DOIs
Publication statusPublished - Sep 2 1997
EventMicrolithography and Metrology in Micromachining III 1997 - Austin, United States
Duration: Sep 29 1997Sep 30 1997

Keywords

  • Anisotropic etching
  • Cad tools
  • Hdl-A
  • Mems
  • Microsystems
  • Modeling

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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  • Cite this

    Boutamine, H., Karam, J. M., Courtois, B., Drake, P., Oudinot, J., Tahawi, H. E. L., Rencz, M., Popped, A., & Szekely, V. (1997). Engineering tool set for monolithic and hybrid microsystem design. Proceedings of SPIE - The International Society for Optical Engineering, 3225, 76-84. https://doi.org/10.1117/12.284556