EDS peak height ratio method has been used for chemical microanalysis of PSG samples in a scanning electron microscope. We have applied a no-standard inverse ZAF-type correction procedure to calculate working curves as a function of beam energy and take-off angle. With the obtained correction procedure the EDS measurement is fast, precise and accurate compared with other physical techniques. Using this method a proportional relationship has been verified between the PH3/SiH4 ratio of the CVD process and the P concentration of the deposited PSG layer.
ASJC Scopus subject areas
- Nuclear and High Energy Physics