ELECTRON INELASTIC MEAN FREE PATH (IMFP) IN SINGLE CRYSTAL BeO BY RUTHERFORD BACKSCATTERING (RBS) AND AUGER ELECTRON SPECTROSCOPY (AES).

D. E. Fowler, J. Gyulai, C. Palmstrom

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11 Citations (Scopus)

Abstract

Quantitative studies of oxidation kinetics by electron spectroscopies require knowledge of the IMFP of electrons in the oxide. In general, IMFP data for oxides are not available. A method is presented for the determination of the IMFP in beryllium oxide using RBS to determine the oxide thickness and AES to measure the chemically shifted Be Auger electron intensity from the BeO-covered surface and the unshifted signal from the Be substrate. Using the normal exponential attenuation relationship between material thickness and the AES signal passing through the material, an IMFP of 6. 0 plus or minus 0. 8 monolayers is determined for approximately 100 ev electrons in HeO. In these experiments the oxide was grown at a temperature (approximately 700 K) which ensured a good single crystal epitaxy on the substrate. Because of this good structural characterization, the IMFP can be presented equally well in units of monolayers or in units of length. The accuracy of the method and its general applicability to other materials is discussed.

Original languageEnglish
Pages (from-to)1021-1025
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume1
Issue number2 pt 2
DOIs
Publication statusPublished - Apr 1982

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Rutherford backscattering spectroscopy
Auger electron spectroscopy
mean free path
Oxides
Auger spectroscopy
electron spectroscopy
backscattering
Single crystals
Electrons
single crystals
oxides
Monolayers
electrons
Beryllia
Electron spectroscopy
beryllium oxides
electron flux density
Substrates
Epitaxial growth
epitaxy

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

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title = "ELECTRON INELASTIC MEAN FREE PATH (IMFP) IN SINGLE CRYSTAL BeO BY RUTHERFORD BACKSCATTERING (RBS) AND AUGER ELECTRON SPECTROSCOPY (AES).",
abstract = "Quantitative studies of oxidation kinetics by electron spectroscopies require knowledge of the IMFP of electrons in the oxide. In general, IMFP data for oxides are not available. A method is presented for the determination of the IMFP in beryllium oxide using RBS to determine the oxide thickness and AES to measure the chemically shifted Be Auger electron intensity from the BeO-covered surface and the unshifted signal from the Be substrate. Using the normal exponential attenuation relationship between material thickness and the AES signal passing through the material, an IMFP of 6. 0 plus or minus 0. 8 monolayers is determined for approximately 100 ev electrons in HeO. In these experiments the oxide was grown at a temperature (approximately 700 K) which ensured a good single crystal epitaxy on the substrate. Because of this good structural characterization, the IMFP can be presented equally well in units of monolayers or in units of length. The accuracy of the method and its general applicability to other materials is discussed.",
author = "Fowler, {D. E.} and J. Gyulai and C. Palmstrom",
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T1 - ELECTRON INELASTIC MEAN FREE PATH (IMFP) IN SINGLE CRYSTAL BeO BY RUTHERFORD BACKSCATTERING (RBS) AND AUGER ELECTRON SPECTROSCOPY (AES).

AU - Fowler, D. E.

AU - Gyulai, J.

AU - Palmstrom, C.

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N2 - Quantitative studies of oxidation kinetics by electron spectroscopies require knowledge of the IMFP of electrons in the oxide. In general, IMFP data for oxides are not available. A method is presented for the determination of the IMFP in beryllium oxide using RBS to determine the oxide thickness and AES to measure the chemically shifted Be Auger electron intensity from the BeO-covered surface and the unshifted signal from the Be substrate. Using the normal exponential attenuation relationship between material thickness and the AES signal passing through the material, an IMFP of 6. 0 plus or minus 0. 8 monolayers is determined for approximately 100 ev electrons in HeO. In these experiments the oxide was grown at a temperature (approximately 700 K) which ensured a good single crystal epitaxy on the substrate. Because of this good structural characterization, the IMFP can be presented equally well in units of monolayers or in units of length. The accuracy of the method and its general applicability to other materials is discussed.

AB - Quantitative studies of oxidation kinetics by electron spectroscopies require knowledge of the IMFP of electrons in the oxide. In general, IMFP data for oxides are not available. A method is presented for the determination of the IMFP in beryllium oxide using RBS to determine the oxide thickness and AES to measure the chemically shifted Be Auger electron intensity from the BeO-covered surface and the unshifted signal from the Be substrate. Using the normal exponential attenuation relationship between material thickness and the AES signal passing through the material, an IMFP of 6. 0 plus or minus 0. 8 monolayers is determined for approximately 100 ev electrons in HeO. In these experiments the oxide was grown at a temperature (approximately 700 K) which ensured a good single crystal epitaxy on the substrate. Because of this good structural characterization, the IMFP can be presented equally well in units of monolayers or in units of length. The accuracy of the method and its general applicability to other materials is discussed.

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