Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering

E. Broitman, N. Hellgren, K. Järrendahl, M. P. Johansson, S. Olafsson, G. Radnóczi, J. E. Sundgren, L. Hultman

Research output: Contribution to journalArticle

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Abstract

The electrical and optical properties of carbon-nitride CNx films (O≤x≤0.25) deposited by unbalanced reactive magnetron sputtering from a graphite target in mixed Ar/N2 discharges at a substrate temperature of 350°C have been investigated. Pure C films exhibit a dark conductivity at room temperature of 250 Ω-1 cm-1, which grows up to 250 Ω-1 cm-1 for CNx films with N content of 20%. For CNx films, temperature-dependent conductivity measurements suggest that two electron conduction processes exist in the investigated temperature range 1302 bonds in the material. The measured electrical and optical properties of the films are related to the apparent film microstructure and bonding nature. Electron microscopy show that the addition of N2 in an Ar discharge leads to a transformation from amorphous to a fullerene-like microstructure consisting of curved, frequently intersecting, and highly in-plane oriented basal lattice planes.

Original languageEnglish
Pages (from-to)1184-1190
Number of pages7
JournalJournal of Applied Physics
Volume89
Issue number2
DOIs
Publication statusPublished - Jan 15 2001

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magnetron sputtering
electrical properties
optical properties
conductivity
microstructure
carbon nitrides
conduction electrons
fullerenes
temperature
electron microscopy
graphite
room temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Broitman, E., Hellgren, N., Järrendahl, K., Johansson, M. P., Olafsson, S., Radnóczi, G., ... Hultman, L. (2001). Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering. Journal of Applied Physics, 89(2), 1184-1190. https://doi.org/10.1063/1.1334370

Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering. / Broitman, E.; Hellgren, N.; Järrendahl, K.; Johansson, M. P.; Olafsson, S.; Radnóczi, G.; Sundgren, J. E.; Hultman, L.

In: Journal of Applied Physics, Vol. 89, No. 2, 15.01.2001, p. 1184-1190.

Research output: Contribution to journalArticle

Broitman, E, Hellgren, N, Järrendahl, K, Johansson, MP, Olafsson, S, Radnóczi, G, Sundgren, JE & Hultman, L 2001, 'Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering', Journal of Applied Physics, vol. 89, no. 2, pp. 1184-1190. https://doi.org/10.1063/1.1334370
Broitman, E. ; Hellgren, N. ; Järrendahl, K. ; Johansson, M. P. ; Olafsson, S. ; Radnóczi, G. ; Sundgren, J. E. ; Hultman, L. / Electrical and optical properties of CNx(0≤x≤0.25) films deposited by reactive magnetron sputtering. In: Journal of Applied Physics. 2001 ; Vol. 89, No. 2. pp. 1184-1190.
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