Effect of oxide coverage on the growth of amorphous Al 2Pt phase on an Al surface

András Kovács, P. Barna

Research output: Contribution to journalArticle

Abstract

In the present experiments the high temperature successive deposition (HTSD) of Al and Pt and the half shadowing technique producing wedge shaped area with increasing quantity of deposited Pt are applied for studying the initial stages of solid phase reaction producing amorphous Al 2Pt phase. The nucleation of Al 2Pt phase results in a decoration pattern which could be related to the characteristic local oxide coverage of the Al crystal surface developing by kinetic segregation of oxygen species during the Al film deposition. In the area of larger amount of deposited Pt, where the Al 2Pt phase is continuous Kirkendall voids are present. The samples were investigated in plane by transmission electron microscopy (TEM) and selected area electron diffraction (SAED) and analysed by energy dispersive X-ray spectroscopy (EDX).

Original languageEnglish
Pages (from-to)93-96
Number of pages4
JournalMikrochimica Acta
Volume139
Issue number1-4
Publication statusPublished - 2002

Fingerprint

Oxides
Electron diffraction
Nucleation
Oxygen
Transmission electron microscopy
Crystals
Kinetics
Experiments
Temperature
X-Ray Emission Spectrometry

Keywords

  • Al-Pt
  • Amorphous phase
  • Kirkendall voids
  • TEM

ASJC Scopus subject areas

  • Analytical Chemistry

Cite this

Effect of oxide coverage on the growth of amorphous Al 2Pt phase on an Al surface. / Kovács, András; Barna, P.

In: Mikrochimica Acta, Vol. 139, No. 1-4, 2002, p. 93-96.

Research output: Contribution to journalArticle

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