Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: Comparison of Ar, H2 and CF4

B. Bruneau, T. Lafleur, T. Gans, D. O'Connell, A. Greb, I. Korolov, A. Derzsi, Z. Donkó, S. Brandt, E. Schüngel, J. Schulze, P. Diomede, D. J. Economou, S. Longo, E. Johnson, J. P. Booth

Research output: Contribution to journalArticle

26 Citations (Scopus)

Abstract

Tailored voltage excitation waveforms provide an efficient control of the ion energy (through the electrical asymmetry effect) in capacitive plasmas by varying the 'amplitude' asymmetry of the waveform. In this work, the effect of a 'slope' asymmetry of the waveform is investigated by using sawtooth-like waveforms, through which the sheath dynamic can be manipulated. A remarkably different discharge dynamic is found for Ar, H2, and CF4 gases, which is explained by the different dominant electron heating mechanisms and plasma chemistries. In comparison to Argon we find that the electrical asymmetry can even be reversed by using an electronegative gas such as CF4. Phase resolved optical emission spectroscopy measurements, probing the spatiotemporal distribution of the excitation rate show excellent agreement with the results of particle-in-cell simulations, confirming the high degree of correlation between the excitation rates with the dominant heating mechanisms in the various gases. It is shown that, depending on the gas used, sawtooth-like voltage waveforms may cause a strong asymmetry.

Original languageEnglish
Article number01LT02
JournalPlasma Sources Science and Technology
Volume25
Issue number1
DOIs
Publication statusPublished - Dec 1 2015

Fingerprint

asymmetry
slopes
waveforms
gases
sawtooth waveforms
excitation
plasma chemistry
heating
optical emission spectroscopy
electric potential
sheaths
argon
chemistry
causes
cells
ions
electrons
simulation
energy

Keywords

  • electrical asymmetry effect
  • electron heating
  • PIC modeling
  • PROES
  • sawtooth waveforms
  • tailored voltage waveforms

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas : Comparison of Ar, H2 and CF4. / Bruneau, B.; Lafleur, T.; Gans, T.; O'Connell, D.; Greb, A.; Korolov, I.; Derzsi, A.; Donkó, Z.; Brandt, S.; Schüngel, E.; Schulze, J.; Diomede, P.; Economou, D. J.; Longo, S.; Johnson, E.; Booth, J. P.

In: Plasma Sources Science and Technology, Vol. 25, No. 1, 01LT02, 01.12.2015.

Research output: Contribution to journalArticle

Bruneau, B, Lafleur, T, Gans, T, O'Connell, D, Greb, A, Korolov, I, Derzsi, A, Donkó, Z, Brandt, S, Schüngel, E, Schulze, J, Diomede, P, Economou, DJ, Longo, S, Johnson, E & Booth, JP 2015, 'Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: Comparison of Ar, H2 and CF4', Plasma Sources Science and Technology, vol. 25, no. 1, 01LT02. https://doi.org/10.1088/0963-0252/25/1/01LT02
Bruneau, B. ; Lafleur, T. ; Gans, T. ; O'Connell, D. ; Greb, A. ; Korolov, I. ; Derzsi, A. ; Donkó, Z. ; Brandt, S. ; Schüngel, E. ; Schulze, J. ; Diomede, P. ; Economou, D. J. ; Longo, S. ; Johnson, E. ; Booth, J. P. / Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas : Comparison of Ar, H2 and CF4. In: Plasma Sources Science and Technology. 2015 ; Vol. 25, No. 1.
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