E-beam induced mass transport in amorphous As 20Se 80 films

C. Cserhati, S. Charnovych, P. M. Lytvyn, M. L. Trunov, D. L. Beke, Y. Kaganovskii, S. Kökényesi

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

E-beam irradiation induced mass transport in thin chalcogenide films As 20Se 80 has been detected and investigated. After irradiation in SEM by a given fluence, the profiles of the irradiated areas were analyzed both by AFM and SEM. Line e-beam scan of the film results in formation of ridges and depressions near the ridges, both grow with the exposure time. It is demonstrated that formation of ridges and depressions is induced by e-beam accelerated lateral mass transport. This is confirmed by experiments on flattening under e-beam irradiation of surface relief gratings preliminary produced on the film surface. The lateral mass transport in this case is caused by capillary forces and mobility of the film constituents is accelerated by e-irradiation. E-beam induced diffusion coefficients have been determined from the flattening kinetics.

Original languageEnglish
Pages (from-to)113-116
Number of pages4
JournalMaterials Letters
Volume85
DOIs
Publication statusPublished - Oct 15 2012

Keywords

  • Amorphous chalcogenide films
  • Diffusion
  • Electron-beam induced mass transport
  • Surface profile variation

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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