Doping silica beyond limits with laser plasma for active photonic materials

Jayakrishnan Chandrappan, Matthew Murray, Peter Petrik, Emil Agocs, Zsolt Zolnai, Agnès Tempez, Sébastien Legendre, D. P. Steenson, Animesh Jha, Gin Jose

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The limited solubility of rare-earths in silica hampers the development of loss-compensated photonic integrated circuits. We report a novel method using femtosecond laser plasma assisted hybrid material integration of rare-earth-doped tellurite with silica, achieving high doping concentration of Er3+ and Yb3+-ions, 1.63 × 1021 atoms.cm3+, without segregation validated by Er3+:4I13/2 lifetime of 9.1 ms. The sequential ablation of two individual rare-earth (Er3+/Yb3+) doped-tellurite glass targets produces an exceptional intermixing of Er3+ and Yb3+-ions extending to the pristine silica with sharp interface. Formation of such homogeneous glass structure with Er3+-Yb3+-ions in a matrix of silica is not possible to realise by conventional methods.

Original languageEnglish
Pages (from-to)2849-2861
Number of pages13
JournalOptical Materials Express
Volume5
Issue number12
DOIs
Publication statusPublished - 2015

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Doping silica beyond limits with laser plasma for active photonic materials'. Together they form a unique fingerprint.

  • Cite this

    Chandrappan, J., Murray, M., Petrik, P., Agocs, E., Zolnai, Z., Tempez, A., Legendre, S., Steenson, D. P., Jha, A., & Jose, G. (2015). Doping silica beyond limits with laser plasma for active photonic materials. Optical Materials Express, 5(12), 2849-2861. https://doi.org/10.1364/OME.5.002849