Direct determination of trace amounts of silicon in iron oxide by graphite furnace and flame atomic absorption spectrometry using halocarbon vapour for fluoride evolution

T. Kántor, Manuel Alvarez Prieto

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The fluorination of different chemical forms of silicon has been studied using copper(II) hydroxyfluoride solid reagent and C2Cl 3F3 vapour in a graphite tube furnace. The method of transportation of the evolved substances from this type of furnace into an acetylene - dinitrogen oxide flame and suitable techniques for handling solid samples were elaborated. The internal gas (Ar) of the furnace was used as the carrier on volatilisation of the halocarbon liquid, which ensured simple operation. The detection limit was 0.84 μg l-1 of Si in iron oxide when taking 40 mg of solid sample and evaluating the peak absorbance measurements. The average RSD was 4.7% in the concentration range 8-36 μg l-1 of Si.

Original languageEnglish
Pages (from-to)53-61
Number of pages9
JournalJournal of Analytical Atomic Spectrometry
Volume3
Issue number1
Publication statusPublished - 1988

Fingerprint

Halocarbons
Atomic absorption spectrometry
Graphite
Silicon
Fluorides
Furnaces
Vapors
Acetylene
Fluorination
Vaporization
Oxides
Copper
Gases
Liquids
ferric oxide

Keywords

  • Fluorination with copper(II) hydroxyfluoride and trichlorotrifluoroethane
  • Graphite furnace and flame combined source
  • Silicon determination
  • Silicon tetrafluoride evolution
  • Solid sample analysis of iron oxide

ASJC Scopus subject areas

  • Spectroscopy

Cite this

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abstract = "The fluorination of different chemical forms of silicon has been studied using copper(II) hydroxyfluoride solid reagent and C2Cl 3F3 vapour in a graphite tube furnace. The method of transportation of the evolved substances from this type of furnace into an acetylene - dinitrogen oxide flame and suitable techniques for handling solid samples were elaborated. The internal gas (Ar) of the furnace was used as the carrier on volatilisation of the halocarbon liquid, which ensured simple operation. The detection limit was 0.84 μg l-1 of Si in iron oxide when taking 40 mg of solid sample and evaluating the peak absorbance measurements. The average RSD was 4.7{\%} in the concentration range 8-36 μg l-1 of Si.",
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T1 - Direct determination of trace amounts of silicon in iron oxide by graphite furnace and flame atomic absorption spectrometry using halocarbon vapour for fluoride evolution

AU - Kántor, T.

AU - Prieto, Manuel Alvarez

PY - 1988

Y1 - 1988

N2 - The fluorination of different chemical forms of silicon has been studied using copper(II) hydroxyfluoride solid reagent and C2Cl 3F3 vapour in a graphite tube furnace. The method of transportation of the evolved substances from this type of furnace into an acetylene - dinitrogen oxide flame and suitable techniques for handling solid samples were elaborated. The internal gas (Ar) of the furnace was used as the carrier on volatilisation of the halocarbon liquid, which ensured simple operation. The detection limit was 0.84 μg l-1 of Si in iron oxide when taking 40 mg of solid sample and evaluating the peak absorbance measurements. The average RSD was 4.7% in the concentration range 8-36 μg l-1 of Si.

AB - The fluorination of different chemical forms of silicon has been studied using copper(II) hydroxyfluoride solid reagent and C2Cl 3F3 vapour in a graphite tube furnace. The method of transportation of the evolved substances from this type of furnace into an acetylene - dinitrogen oxide flame and suitable techniques for handling solid samples were elaborated. The internal gas (Ar) of the furnace was used as the carrier on volatilisation of the halocarbon liquid, which ensured simple operation. The detection limit was 0.84 μg l-1 of Si in iron oxide when taking 40 mg of solid sample and evaluating the peak absorbance measurements. The average RSD was 4.7% in the concentration range 8-36 μg l-1 of Si.

KW - Fluorination with copper(II) hydroxyfluoride and trichlorotrifluoroethane

KW - Graphite furnace and flame combined source

KW - Silicon determination

KW - Silicon tetrafluoride evolution

KW - Solid sample analysis of iron oxide

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