Determination of overlayer thickness by QUASES analysis of photon-excited KLL Auger spectra of Ni and Cu films

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20 Citations (Scopus)

Abstract

Quantitative characterization of overlayer nanostructures is important for many practical applications and has become a feasible task for electron spectroscopy. The QUASES (Quantitative Analysis of Surfaces by Electron Spectroscopy) software package, developed recently, provides a general tool for quantification in XPS by analysing the spectral shape of the background caused by inelastic scattering of the signal electrons and has been applied successfully for determining the thickness of surface films in the nanometre range. In this work the application of such analysis is extended to metallic films having several tens of nanometre thickness and the accuracy of the results is tested by using independent methods. Both Ni and Cu KLL Auger spectra were photoexcited from Ni and Cu overlayers (deposited onto Si substrates) of different thicknesses in the 10-60 nm range, and were measured with high energy resolution. The film thickness values from the QUASES spectral shape analysis are compared with the data obtained by using a quartz crystal microbalance, cross-sectional transmission electron microscopy and scanning probe microscopy (SPM). Good consistency has been found for the thickness values obtained from the spectral shape analysis and from microscopy, especially for Ni films. Assuming nominal film thickness, the values of the inelastic mean free path of 6-7 keV energy electrons in Ni and Cu were also determined, showing good (Ni) or reasonable (Cu) agreement with those proposed by Powell and Jablonski. The effect of island formation was shown by the QUASES spectral shape analysis and confirmed by SPM.

Original languageEnglish
Pages (from-to)271-279
Number of pages9
JournalSurface and Interface Analysis
Volume31
Issue number4
DOIs
Publication statusPublished - Apr 2001

Fingerprint

Electron spectroscopy
quantitative analysis
electron spectroscopy
Photons
Scanning probe microscopy
photons
microscopy
Chemical analysis
Film thickness
film thickness
Metallic films
Inelastic scattering
scanning
Electrons
probes
Quartz crystal microbalances
quartz crystals
Software packages
microbalances
mean free path

Keywords

  • KLL Auger spectra
  • Ni and Cu thin films
  • Thickness determination
  • X-ray-excited AES

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

@article{4dbec794f7f54d80992587fd1e703adf,
title = "Determination of overlayer thickness by QUASES analysis of photon-excited KLL Auger spectra of Ni and Cu films",
abstract = "Quantitative characterization of overlayer nanostructures is important for many practical applications and has become a feasible task for electron spectroscopy. The QUASES (Quantitative Analysis of Surfaces by Electron Spectroscopy) software package, developed recently, provides a general tool for quantification in XPS by analysing the spectral shape of the background caused by inelastic scattering of the signal electrons and has been applied successfully for determining the thickness of surface films in the nanometre range. In this work the application of such analysis is extended to metallic films having several tens of nanometre thickness and the accuracy of the results is tested by using independent methods. Both Ni and Cu KLL Auger spectra were photoexcited from Ni and Cu overlayers (deposited onto Si substrates) of different thicknesses in the 10-60 nm range, and were measured with high energy resolution. The film thickness values from the QUASES spectral shape analysis are compared with the data obtained by using a quartz crystal microbalance, cross-sectional transmission electron microscopy and scanning probe microscopy (SPM). Good consistency has been found for the thickness values obtained from the spectral shape analysis and from microscopy, especially for Ni films. Assuming nominal film thickness, the values of the inelastic mean free path of 6-7 keV energy electrons in Ni and Cu were also determined, showing good (Ni) or reasonable (Cu) agreement with those proposed by Powell and Jablonski. The effect of island formation was shown by the QUASES spectral shape analysis and confirmed by SPM.",
keywords = "KLL Auger spectra, Ni and Cu thin films, Thickness determination, X-ray-excited AES",
author = "L. K{\"o}v{\'e}r and S. Tougaard and J. T{\'o}th and L. Dar{\'o}czi and I. Szab{\'o} and G. Langer and M. Menyh{\'a}rd",
year = "2001",
month = "4",
doi = "10.1002/sia.988",
language = "English",
volume = "31",
pages = "271--279",
journal = "Surface and Interface Analysis",
issn = "0142-2421",
publisher = "John Wiley and Sons Ltd",
number = "4",

}

TY - JOUR

T1 - Determination of overlayer thickness by QUASES analysis of photon-excited KLL Auger spectra of Ni and Cu films

AU - Kövér, L.

AU - Tougaard, S.

AU - Tóth, J.

AU - Daróczi, L.

AU - Szabó, I.

AU - Langer, G.

AU - Menyhárd, M.

PY - 2001/4

Y1 - 2001/4

N2 - Quantitative characterization of overlayer nanostructures is important for many practical applications and has become a feasible task for electron spectroscopy. The QUASES (Quantitative Analysis of Surfaces by Electron Spectroscopy) software package, developed recently, provides a general tool for quantification in XPS by analysing the spectral shape of the background caused by inelastic scattering of the signal electrons and has been applied successfully for determining the thickness of surface films in the nanometre range. In this work the application of such analysis is extended to metallic films having several tens of nanometre thickness and the accuracy of the results is tested by using independent methods. Both Ni and Cu KLL Auger spectra were photoexcited from Ni and Cu overlayers (deposited onto Si substrates) of different thicknesses in the 10-60 nm range, and were measured with high energy resolution. The film thickness values from the QUASES spectral shape analysis are compared with the data obtained by using a quartz crystal microbalance, cross-sectional transmission electron microscopy and scanning probe microscopy (SPM). Good consistency has been found for the thickness values obtained from the spectral shape analysis and from microscopy, especially for Ni films. Assuming nominal film thickness, the values of the inelastic mean free path of 6-7 keV energy electrons in Ni and Cu were also determined, showing good (Ni) or reasonable (Cu) agreement with those proposed by Powell and Jablonski. The effect of island formation was shown by the QUASES spectral shape analysis and confirmed by SPM.

AB - Quantitative characterization of overlayer nanostructures is important for many practical applications and has become a feasible task for electron spectroscopy. The QUASES (Quantitative Analysis of Surfaces by Electron Spectroscopy) software package, developed recently, provides a general tool for quantification in XPS by analysing the spectral shape of the background caused by inelastic scattering of the signal electrons and has been applied successfully for determining the thickness of surface films in the nanometre range. In this work the application of such analysis is extended to metallic films having several tens of nanometre thickness and the accuracy of the results is tested by using independent methods. Both Ni and Cu KLL Auger spectra were photoexcited from Ni and Cu overlayers (deposited onto Si substrates) of different thicknesses in the 10-60 nm range, and were measured with high energy resolution. The film thickness values from the QUASES spectral shape analysis are compared with the data obtained by using a quartz crystal microbalance, cross-sectional transmission electron microscopy and scanning probe microscopy (SPM). Good consistency has been found for the thickness values obtained from the spectral shape analysis and from microscopy, especially for Ni films. Assuming nominal film thickness, the values of the inelastic mean free path of 6-7 keV energy electrons in Ni and Cu were also determined, showing good (Ni) or reasonable (Cu) agreement with those proposed by Powell and Jablonski. The effect of island formation was shown by the QUASES spectral shape analysis and confirmed by SPM.

KW - KLL Auger spectra

KW - Ni and Cu thin films

KW - Thickness determination

KW - X-ray-excited AES

UR - http://www.scopus.com/inward/record.url?scp=0035305243&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035305243&partnerID=8YFLogxK

U2 - 10.1002/sia.988

DO - 10.1002/sia.988

M3 - Article

AN - SCOPUS:0035305243

VL - 31

SP - 271

EP - 279

JO - Surface and Interface Analysis

JF - Surface and Interface Analysis

SN - 0142-2421

IS - 4

ER -