Detailed model on amorphous Al-Pt phase growth in thin film systems

Zs Radi, P. B. Barna

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We present an amorphous phase growth model in the Al-Pt thin film system prepared by high-temperature successive deposition (HTSD) under various experimental conditions. Our theory is based on detailed TEM, XTEM and SAED investigations. The model contains a brief explanation of the quasi two-dimensional phase formation on the sample surface during Pt deposition and deals with the diffusional Al transport in the newly developed Al-Pt phases. Theoretical calculations, according to the experimental results, prove the existence of a critical thickness (LC1) of the amorphous phase. Related phenomena of intermetallic phase nucleation (Al3Pt2) and amorphous ⇒ polycrystalline phase transition are also treated. Additionally, the diffusional limitation of the growth of coexisting amorphous - intermetallic phases could be explained and characterised by the second critical thickness (LC2). It will be shown also that various thin film structures, e.g. thick (250 nm) pure a-Al2Pt surface coatings, can be tailored by using HTSD and different parameter ranges.

Original languageEnglish
Pages (from-to)90-93
Number of pages4
JournalSurface and Coatings Technology
Volume100-101
Issue number1-3
DOIs
Publication statusPublished - Mar 1998

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Keywords

  • Al-Pt
  • Amorphous phase growth
  • Thin film

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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