Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films

Z. Pápa, J. Budai, I. Hanyecz, J. Csontos, Z. Tóth

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A method allowing for the separation of scattering-caused depolarization from depolarization due to film thickness inhomogeneity on isotropic samples is presented. Mueller-matrix analysis shows that M22 matrix-element is correlated with the scattering-caused depolarization, and correction of the measured depolarization spectra with M22 element excludes this type of depolarization from the spectra. Ellipsometric measurements performed on polycrystalline ZnO samples with smooth and scattering surface, with uniform and non-uniform layer thickness in every possible combination confirm the suggested method. Besides depolarization, ellipsometric analysis and optical properties of the ZnO films are discussed.

Original languageEnglish
Pages (from-to)562-566
Number of pages5
JournalThin Solid Films
Volume571
Issue numberP3
DOIs
Publication statusPublished - Nov 28 2014

Fingerprint

Zinc Oxide
Depolarization
Zinc oxide
depolarization
zinc oxides
Oxide films
oxide films
grain size
Scattering
scattering
Film thickness
inhomogeneity
film thickness
Optical properties
optical properties
matrices

Keywords

  • Depolarization
  • Ellipsometry
  • Pulsed laser deposition
  • Rough surfaces
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films. / Pápa, Z.; Budai, J.; Hanyecz, I.; Csontos, J.; Tóth, Z.

In: Thin Solid Films, Vol. 571, No. P3, 28.11.2014, p. 562-566.

Research output: Contribution to journalArticle

Pápa, Z. ; Budai, J. ; Hanyecz, I. ; Csontos, J. ; Tóth, Z. / Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films. In: Thin Solid Films. 2014 ; Vol. 571, No. P3. pp. 562-566.
@article{188e586bd6274655831460a55d7839dc,
title = "Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films",
abstract = "A method allowing for the separation of scattering-caused depolarization from depolarization due to film thickness inhomogeneity on isotropic samples is presented. Mueller-matrix analysis shows that M22 matrix-element is correlated with the scattering-caused depolarization, and correction of the measured depolarization spectra with M22 element excludes this type of depolarization from the spectra. Ellipsometric measurements performed on polycrystalline ZnO samples with smooth and scattering surface, with uniform and non-uniform layer thickness in every possible combination confirm the suggested method. Besides depolarization, ellipsometric analysis and optical properties of the ZnO films are discussed.",
keywords = "Depolarization, Ellipsometry, Pulsed laser deposition, Rough surfaces, ZnO",
author = "Z. P{\'a}pa and J. Budai and I. Hanyecz and J. Csontos and Z. T{\'o}th",
year = "2014",
month = "11",
day = "28",
doi = "10.1016/j.tsf.2013.10.184",
language = "English",
volume = "571",
pages = "562--566",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "P3",

}

TY - JOUR

T1 - Depolarization correction method for ellipsometric measurements of large grain size zinc-oxide films

AU - Pápa, Z.

AU - Budai, J.

AU - Hanyecz, I.

AU - Csontos, J.

AU - Tóth, Z.

PY - 2014/11/28

Y1 - 2014/11/28

N2 - A method allowing for the separation of scattering-caused depolarization from depolarization due to film thickness inhomogeneity on isotropic samples is presented. Mueller-matrix analysis shows that M22 matrix-element is correlated with the scattering-caused depolarization, and correction of the measured depolarization spectra with M22 element excludes this type of depolarization from the spectra. Ellipsometric measurements performed on polycrystalline ZnO samples with smooth and scattering surface, with uniform and non-uniform layer thickness in every possible combination confirm the suggested method. Besides depolarization, ellipsometric analysis and optical properties of the ZnO films are discussed.

AB - A method allowing for the separation of scattering-caused depolarization from depolarization due to film thickness inhomogeneity on isotropic samples is presented. Mueller-matrix analysis shows that M22 matrix-element is correlated with the scattering-caused depolarization, and correction of the measured depolarization spectra with M22 element excludes this type of depolarization from the spectra. Ellipsometric measurements performed on polycrystalline ZnO samples with smooth and scattering surface, with uniform and non-uniform layer thickness in every possible combination confirm the suggested method. Besides depolarization, ellipsometric analysis and optical properties of the ZnO films are discussed.

KW - Depolarization

KW - Ellipsometry

KW - Pulsed laser deposition

KW - Rough surfaces

KW - ZnO

UR - http://www.scopus.com/inward/record.url?scp=84920705523&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84920705523&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2013.10.184

DO - 10.1016/j.tsf.2013.10.184

M3 - Article

VL - 571

SP - 562

EP - 566

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - P3

ER -