Dependence of the thickness profile of pulsed laser deposited bismuth films on process parameters

T. Szörényi, J. M. Ballesteros

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High resolution, two-dimensional thickness profiles of ArF excimer laser deposited Bi films are recorded by a microdensitometer. The azimuthal dependent cross-sectional profiles are consistently fitted by linear combinations of a cos 4 Θ evaporation-like component and a much more sharply peaked one with exponents ranging from 8 to 61. When keeping the laser spot dimensions fixed, no dependence on laser fluence is obtained. An increase in Ar pressure from 10 -6 to 10 -1 Torr leads to the sharpening of the angular distribution along both axes: the forward directed component narrows from cos 23 Θ to cos 61 Θ along the short, and from cos 9 Θ to cos 17 Θ along the long axis, respectively. Further increase in pressure results in a sudden broadening leading to circular symmetry at around 0.5 Torr. Above 10 -4 Torr the deposition rate continuously decreases with increasing Ar pressure. In He atmosphere only narrowing is obtained above 10 -1 Torr.

Original languageEnglish
Pages (from-to)327-330
Number of pages4
JournalApplied Surface Science
Publication statusPublished - Feb 1997


ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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