Dependence of the surface roughness and localization factor parameters on the background correction of afm images: A thin film characterization study

Attila Bonyár, László Milán Molnár, Gábor Harsányi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

A novel parameter called localization factor was calculated on contact mode atomic force microscope (AFM) images taken on gold thin film surfaces and was compared with the surface roughness parameters (Ra, RRMS). The aim of the investigation was to examine the dependence of these surface describing parameters on the background correction (generally post processing) of the AFM image. We found that the proposed localization factor parameter shows less dependence on the background correction compared to the surface roughness parameters and that it gives an identically characteristic value for four different thin film surfaces on the (1-100 μm2) scan range.

Original languageEnglish
Title of host publicationMaterials Science, Testing and Informatics VI
Pages193-198
Number of pages6
DOIs
Publication statusPublished - Jan 1 2013
Event8th Hungarian Conference on Materials Science - Balatonkenese, Hungary
Duration: Oct 9 2011Oct 11 2011

Publication series

NameMaterials Science Forum
Volume729
ISSN (Print)0255-5476

Other

Other8th Hungarian Conference on Materials Science
CountryHungary
CityBalatonkenese
Period10/9/1110/11/11

Keywords

  • Atomic force microscopy (AFM)
  • Background correction
  • Gold thin film
  • Localization factor
  • Structural entropy
  • Surface roughness

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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