Decomposition of halogenated methanes in oxygen-free gas mixtures by the use of a silent electric discharge

K. A. Föglein, J. Szépvölgyi, A. Dombi

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

A silent electric discharge was applied to decompose halogenated methanes including CCl4, CHCl3, CFCl3, CF2Cl2 and CF3Cl, in argon-containing gas mixtures. The decompositions of the target compounds were studied in static reactors at a fixed electric field and room temperature. The reaction products were analyzed by FT-IR spectroscopy, gas chromatography and UV spectrophotometry. The results demonstrated, that the radical-type decomposition of chlorofluoromethanes led to products formed by realignment of the halogen atoms. The decomposition of CCl4 was faster than that of the cholorofluoromethanes, and produced perchloroethane and chlorine. CHCl3 exhibited the highest decomposition rate and produced a large variety of products.

Original languageEnglish
Pages (from-to)9-13
Number of pages5
JournalChemosphere
Volume50
Issue number1
DOIs
Publication statusPublished - Jan 2003

Keywords

  • Decomposition of chlorofluorocarbons
  • Silent electric discharge

ASJC Scopus subject areas

  • Environmental Engineering
  • Environmental Chemistry
  • Chemistry(all)
  • Pollution
  • Health, Toxicology and Mutagenesis

Fingerprint Dive into the research topics of 'Decomposition of halogenated methanes in oxygen-free gas mixtures by the use of a silent electric discharge'. Together they form a unique fingerprint.

  • Cite this