Damage production and self-annealing during molecular implantation analyzed by RBS and ellipsometry

J. Gyulai, T. Lohner, M. Fried, N. Q. Khanh, Gen Qing Yang, Z. Toth

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The role of thermal effects in primary damage production during ion implantation, i.e., a so-called micro-and macrotemperature, will be outlined. It is suggested that a strict control of thermal conditions around the cascade(s) can be a key factor in implantation technology, especially, when properties of layers implanted in different machines are compared. The role of hot implantation as an annealing concept will be demonstrated for the case of implantation with bi-molecular ions.

Original languageEnglish
Pages (from-to)49-61
Number of pages13
JournalRadiation Effects and Defects in Solids
Volume140
Issue number1
Publication statusPublished - 1996

Fingerprint

Ellipsometry
Ion implantation
Thermal effects
ellipsometry
implantation
Annealing
Ions
damage
annealing
molecular ions
temperature effects
ion implantation
cascades
Hot Temperature

Keywords

  • Annealing
  • bi-molecular ions
  • Ion-implanation

ASJC Scopus subject areas

  • Nuclear Energy and Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Radiation

Cite this

Damage production and self-annealing during molecular implantation analyzed by RBS and ellipsometry. / Gyulai, J.; Lohner, T.; Fried, M.; Khanh, N. Q.; Yang, Gen Qing; Toth, Z.

In: Radiation Effects and Defects in Solids, Vol. 140, No. 1, 1996, p. 49-61.

Research output: Contribution to journalArticle

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