Crystallographic tilting in high-misfit (100) semiconductor heteroepitaxial systems

Research output: Contribution to journalArticle

32 Citations (Scopus)

Abstract

A model is presented for the formation of crystallographic tilting (misorientation) in highly mismatched (100) oriented zinc-blende semiconductor heteroepitaxial layers grown on vicinal substrates. The model is based on the asymmetric generation of 60° misfit dislocations upon island coalescence in the initial growth process and the asymmetric strain release at substrate steps, and predicts a correlation between tilt angle and initial growth planarity. Good agreement is found between model and experimental data on the GaAs/Si and other systems. It is also shown that, if the net tilt is small, an azimuthal rotation of the tilt axis may occur, even if the system symmetry would hinder it. The influence of thermal annealing and thermal mismatch on the tilt is discussed as well.

Original languageEnglish
Pages (from-to)425-430
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume14
Issue number2
DOIs
Publication statusPublished - Jan 1 1996

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Crystallographic tilting in high-misfit (100) semiconductor heteroepitaxial systems'. Together they form a unique fingerprint.

  • Cite this