Cross-sectional transmission electron microscopy study of the microstructure of electrodeposited Co-Ni-Cu/Cu GMR multilayers

Ágnes Cziráki, Jian Guo Zheng, Anny Michel, Zsolt Czigány, Gholamreza Nabiyouni, Walther Schwarzacher, Eniko Tóth-Kádár, Imre Bakonyi

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

In a previous work, we have established that for electrodeposited (ED) Co-Ni-Cu/Cu multilayers the occurrence of giant magnetoresistance (GMR) and its magnitude sensitively depends on the deposition mode (potentiostatic or galvanostatic) and on the Cu substrate texture [(100) or (110)]. In order to have a better understanding of the influence of preparation conditions on the magnetoresistance behaviour of these multilayers, we have now undertaken a detailed cross-sectional microstructural study on the same samples by conventional and high-resolution transmission electron microscopy (TEM). It turned out from this investigation that both, the microstructure and the preferred orientation of the multilayers, are strongly influenced by the preparation conditions. For example, the multilayers with the highest GMR, which are grown potentiostatically on (100)-textured substrates, exhibit a columnar growth with (100) texture. The columns contain a high level of internal strain, relaxed only to a small extent by lattice defects. Multilayers grown galvanostatically on the same substrate, in contrast, have a (111) texture with a large number of extended twins.

Original languageEnglish
Pages (from-to)278-283
Number of pages6
JournalZeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
Volume90
Issue number4
Publication statusPublished - Apr 1 1999

    Fingerprint

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry
  • Metals and Alloys
  • Materials Chemistry

Cite this