Correlation between the average composition of coherent superlattice and the GMR properties of electrodeposited Co-Cu/Cu multilayers

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4 Citations (Scopus)

Abstract

In contrast to vacuum-deposited Co/Cu multilayers the electrodeposited ones do not exhibit any oscillation behaviour in magnetic resistance properties as a function of the thickness of non-magnetic Cu layers. According to the magnetic investigations they show ferromagnetic and superparamagnetic character as a consequence of the lack of antiparallel coupling of neighbouring magnetic layers. Magnetic resistance observed on electrodeposited Co-Cu/Cu multilayers is believed to originate from the randomly antiparallel oriented magnetic domains. In the present paper the evolution of magnetic resistance properties is studied against the average Cu concentration of multilayers prepared under a Cu deposition potential of -0.25 and -0.62 V, and the best magnetic resistance properties were found in the films with composition of 52% and 60% Cu, respectively. The average concentration was determined by electron microscopic and X-ray diffraction measurements.

Original languageEnglish
Pages (from-to)1024-1031
Number of pages8
JournalZeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
Volume96
Issue number9
Publication statusPublished - Sep 2005

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Multilayers
Chemical analysis
Magnetic domains
magnetic domains
Vacuum
X ray diffraction
Electrons
vacuum
oscillations
diffraction
electrons
x rays

Keywords

  • Co-Cu/Cu multilayers
  • Electrodeposition
  • Magnetic resistance
  • Superlattice

ASJC Scopus subject areas

  • Metals and Alloys

Cite this

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title = "Correlation between the average composition of coherent superlattice and the GMR properties of electrodeposited Co-Cu/Cu multilayers",
abstract = "In contrast to vacuum-deposited Co/Cu multilayers the electrodeposited ones do not exhibit any oscillation behaviour in magnetic resistance properties as a function of the thickness of non-magnetic Cu layers. According to the magnetic investigations they show ferromagnetic and superparamagnetic character as a consequence of the lack of antiparallel coupling of neighbouring magnetic layers. Magnetic resistance observed on electrodeposited Co-Cu/Cu multilayers is believed to originate from the randomly antiparallel oriented magnetic domains. In the present paper the evolution of magnetic resistance properties is studied against the average Cu concentration of multilayers prepared under a Cu deposition potential of -0.25 and -0.62 V, and the best magnetic resistance properties were found in the films with composition of 52{\%} and 60{\%} Cu, respectively. The average concentration was determined by electron microscopic and X-ray diffraction measurements.",
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T1 - Correlation between the average composition of coherent superlattice and the GMR properties of electrodeposited Co-Cu/Cu multilayers

AU - Cziráki, A.

AU - Tichy, G.

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N2 - In contrast to vacuum-deposited Co/Cu multilayers the electrodeposited ones do not exhibit any oscillation behaviour in magnetic resistance properties as a function of the thickness of non-magnetic Cu layers. According to the magnetic investigations they show ferromagnetic and superparamagnetic character as a consequence of the lack of antiparallel coupling of neighbouring magnetic layers. Magnetic resistance observed on electrodeposited Co-Cu/Cu multilayers is believed to originate from the randomly antiparallel oriented magnetic domains. In the present paper the evolution of magnetic resistance properties is studied against the average Cu concentration of multilayers prepared under a Cu deposition potential of -0.25 and -0.62 V, and the best magnetic resistance properties were found in the films with composition of 52% and 60% Cu, respectively. The average concentration was determined by electron microscopic and X-ray diffraction measurements.

AB - In contrast to vacuum-deposited Co/Cu multilayers the electrodeposited ones do not exhibit any oscillation behaviour in magnetic resistance properties as a function of the thickness of non-magnetic Cu layers. According to the magnetic investigations they show ferromagnetic and superparamagnetic character as a consequence of the lack of antiparallel coupling of neighbouring magnetic layers. Magnetic resistance observed on electrodeposited Co-Cu/Cu multilayers is believed to originate from the randomly antiparallel oriented magnetic domains. In the present paper the evolution of magnetic resistance properties is studied against the average Cu concentration of multilayers prepared under a Cu deposition potential of -0.25 and -0.62 V, and the best magnetic resistance properties were found in the films with composition of 52% and 60% Cu, respectively. The average concentration was determined by electron microscopic and X-ray diffraction measurements.

KW - Co-Cu/Cu multilayers

KW - Electrodeposition

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KW - Superlattice

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