Correlation between surface oxygen content and microstructure of carbon nitride films

T. Szörényi, A. L. Tóth, I. Bertóti, F. Antoni, E. Fogarassy

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

Carbon nitride films deposited by ArF excimer laser ablation of a graphite target in the 1-100-Pa N2 pressure and 1.0-10-J cm-2 fluence domains differ not only in their nitrogen but also in their oxygen content. The (surface) oxygen content correlates well with the compactness of the films. Oxygen contents below approximately 8 at.%, smooth surface, and mass densities above 2.2 g cm-3 are typical of films deposited at low N2 pressures (and high fluences) while deposition at/above 50 Pa results in films of oxygen contents exceeding 12 at.%, rough surface consisting of loosely connected cluster agglomerates, and density values at approximately 1.4 g cm-3. At medium pressures high fluence processing is advantageous in terms of both nitrogen content and film morphology.

Original languageEnglish
Pages (from-to)1153-1156
Number of pages4
JournalDiamond and Related Materials
Volume11
Issue number3-6
DOIs
Publication statusPublished - Mar 1 2002

Keywords

  • Nitrides
  • Pulsed laser deposition
  • Scanning electron microscopy
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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