CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

János Szívós, Szilárd Pothorszky, Jan Soltys, Miklós Serényi, Hongyu An, Tenghua Gao, A. Deák, Ji Shi, G. Sáfrán

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.

Original languageEnglish
Pages (from-to)31-38
Number of pages8
JournalApplied Surface Science
Volume435
DOIs
Publication statusPublished - Mar 30 2018

Fingerprint

Plasma etching
Magnetic force microscopy
Thin films
Nanospheres
Langmuir Blodgett films
Magnetic variables measurement
Magnetometers
Silicon Dioxide
Electron microscopy
Industrial applications
Nanostructures
Magnetic properties
Silica
Throughput

Keywords

  • Ferromagnetic thin films
  • Langmuir-Blodgett film
  • Nanopatterning
  • Ordered nanostructures
  • RF plasma etching

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media. / Szívós, János; Pothorszky, Szilárd; Soltys, Jan; Serényi, Miklós; An, Hongyu; Gao, Tenghua; Deák, A.; Shi, Ji; Sáfrán, G.

In: Applied Surface Science, Vol. 435, 30.03.2018, p. 31-38.

Research output: Contribution to journalArticle

Szívós, János ; Pothorszky, Szilárd ; Soltys, Jan ; Serényi, Miklós ; An, Hongyu ; Gao, Tenghua ; Deák, A. ; Shi, Ji ; Sáfrán, G. / CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media. In: Applied Surface Science. 2018 ; Vol. 435. pp. 31-38.
@article{5ac20d2120ab455ea6f04583923ddaec,
title = "CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media",
abstract = "CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.",
keywords = "Ferromagnetic thin films, Langmuir-Blodgett film, Nanopatterning, Ordered nanostructures, RF plasma etching",
author = "J{\'a}nos Sz{\'i}v{\'o}s and Szil{\'a}rd Pothorszky and Jan Soltys and Mikl{\'o}s Ser{\'e}nyi and Hongyu An and Tenghua Gao and A. De{\'a}k and Ji Shi and G. S{\'a}fr{\'a}n",
year = "2018",
month = "3",
day = "30",
doi = "10.1016/j.apsusc.2017.11.062",
language = "English",
volume = "435",
pages = "31--38",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

TY - JOUR

T1 - CoPt/TiN films nanopatterned by RF plasma etching towards dot-patterned magnetic media

AU - Szívós, János

AU - Pothorszky, Szilárd

AU - Soltys, Jan

AU - Serényi, Miklós

AU - An, Hongyu

AU - Gao, Tenghua

AU - Deák, A.

AU - Shi, Ji

AU - Sáfrán, G.

PY - 2018/3/30

Y1 - 2018/3/30

N2 - CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.

AB - CoPt thin films as possible candidates for Bit Patterned magnetic Media (BPM) were prepared and investigated by electron microscopy techniques and magnetic measurements. The structure and morphology of the Direct Current (DC) sputtered films with N incorporation were revealed in both as-prepared and annealed state. Nanopatterning of the samples was carried out by means of Radio Frequency (RF) plasma etching through a Langmuir-Blodgett film of silica nanospheres that is a fast and high throughput technique. As a result, the samples with hexagonally arranged 100 nm size separated dots of fct-phase CoPt were obtained. The influence of the order of nanopatterning and anneling on the nanostructure formation was revealed. The magnetic properties of the nanopatterned fct CoPt films were investigated by Vibrating Sample Magnetometer (VSM) and Magnetic Force Microscopy (MFM). The results show that CoPt thin film nanopatterned by means of the RF plasma etching technique is promising candidate to a possible realization of BPM. Furthermore, this technique is versatile and suitable for scaling up to technological and industrial applications.

KW - Ferromagnetic thin films

KW - Langmuir-Blodgett film

KW - Nanopatterning

KW - Ordered nanostructures

KW - RF plasma etching

UR - http://www.scopus.com/inward/record.url?scp=85034046841&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85034046841&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2017.11.062

DO - 10.1016/j.apsusc.2017.11.062

M3 - Article

VL - 435

SP - 31

EP - 38

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -