Composition, structure and mechanical property analysis of DC sputtered C-Ni and CNx-Ni nano-composite layers

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Abstract

Carbon-nickel (C-Ni) and carbon-nitride-nickel (CNx-Ni) films were deposited onto native SiO2 covered Si substrates by DC magnetron sputtering from a graphite-nickel composite target using Ar or N 2 for sputtering at about 2.6 Pa. The substrate temperature varied between 25 and 800°C. The structure, composition and mechanical properties of C-Ni and CNx-Ni thin layers (200-300 nm) have been investigated by high-resolution transmission electron microscopy (HRTEM), XPS, nano-indentation and nano-scratch techniques. The layers were predominantly crystalline irrespective of their deposition conditions. At low deposition temperature, up to 200°C, the columnar crystallites were identified as hexagonal Ni3C, separated by narrow 'walls' of amorphous carbon. At substrate temperatures above 400°C, however, a graphitic multilayer arrangement of the carbon matrix was developed around the nano-crystalline cubic nickel - nickel carbide islands. The mechanical properties of the films varied also significantly with the deposition temperature. The highest nano-hardness of about 14 GPa was measured for the film grown at 200°C, while lower values (2-4 GPa) were obtained for high-temperature films. High hardness values were related to the presence of Ni3C. The lowest friction coefficients were obtained for films containing high amounts of multi-layered graphite-like carbon developed at intermediate deposition temperatures.

Original languageEnglish
Pages (from-to)760-764
Number of pages5
JournalSurface and Interface Analysis
Volume36
Issue number8
DOIs
Publication statusPublished - Aug 2004

Fingerprint

Nickel
Carbon
direct current
nickel
mechanical properties
Mechanical properties
composite materials
carbon
Composite materials
Chemical analysis
Graphite
Temperature
Substrates
hardness
graphite
temperature
Crystalline materials
Nanohardness
carbon nitrides
Carbon nitride

Keywords

  • C-Ni
  • CN-Ni
  • Friction
  • HRTEM
  • Nano-composites
  • Nano-hardness
  • Thin films

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Colloid and Surface Chemistry

Cite this

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title = "Composition, structure and mechanical property analysis of DC sputtered C-Ni and CNx-Ni nano-composite layers",
abstract = "Carbon-nickel (C-Ni) and carbon-nitride-nickel (CNx-Ni) films were deposited onto native SiO2 covered Si substrates by DC magnetron sputtering from a graphite-nickel composite target using Ar or N 2 for sputtering at about 2.6 Pa. The substrate temperature varied between 25 and 800°C. The structure, composition and mechanical properties of C-Ni and CNx-Ni thin layers (200-300 nm) have been investigated by high-resolution transmission electron microscopy (HRTEM), XPS, nano-indentation and nano-scratch techniques. The layers were predominantly crystalline irrespective of their deposition conditions. At low deposition temperature, up to 200°C, the columnar crystallites were identified as hexagonal Ni3C, separated by narrow 'walls' of amorphous carbon. At substrate temperatures above 400°C, however, a graphitic multilayer arrangement of the carbon matrix was developed around the nano-crystalline cubic nickel - nickel carbide islands. The mechanical properties of the films varied also significantly with the deposition temperature. The highest nano-hardness of about 14 GPa was measured for the film grown at 200°C, while lower values (2-4 GPa) were obtained for high-temperature films. High hardness values were related to the presence of Ni3C. The lowest friction coefficients were obtained for films containing high amounts of multi-layered graphite-like carbon developed at intermediate deposition temperatures.",
keywords = "C-Ni, CN-Ni, Friction, HRTEM, Nano-composites, Nano-hardness, Thin films",
author = "T. Ujv{\'a}ri and A. T{\'o}th and Kov{\'a}cs, {Gy J.} and G. S{\'a}fr{\'a}n and O. Geszti and G. Radn{\'o}czi and I. Bert{\'o}ti",
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T1 - Composition, structure and mechanical property analysis of DC sputtered C-Ni and CNx-Ni nano-composite layers

AU - Ujvári, T.

AU - Tóth, A.

AU - Kovács, Gy J.

AU - Sáfrán, G.

AU - Geszti, O.

AU - Radnóczi, G.

AU - Bertóti, I.

PY - 2004/8

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N2 - Carbon-nickel (C-Ni) and carbon-nitride-nickel (CNx-Ni) films were deposited onto native SiO2 covered Si substrates by DC magnetron sputtering from a graphite-nickel composite target using Ar or N 2 for sputtering at about 2.6 Pa. The substrate temperature varied between 25 and 800°C. The structure, composition and mechanical properties of C-Ni and CNx-Ni thin layers (200-300 nm) have been investigated by high-resolution transmission electron microscopy (HRTEM), XPS, nano-indentation and nano-scratch techniques. The layers were predominantly crystalline irrespective of their deposition conditions. At low deposition temperature, up to 200°C, the columnar crystallites were identified as hexagonal Ni3C, separated by narrow 'walls' of amorphous carbon. At substrate temperatures above 400°C, however, a graphitic multilayer arrangement of the carbon matrix was developed around the nano-crystalline cubic nickel - nickel carbide islands. The mechanical properties of the films varied also significantly with the deposition temperature. The highest nano-hardness of about 14 GPa was measured for the film grown at 200°C, while lower values (2-4 GPa) were obtained for high-temperature films. High hardness values were related to the presence of Ni3C. The lowest friction coefficients were obtained for films containing high amounts of multi-layered graphite-like carbon developed at intermediate deposition temperatures.

AB - Carbon-nickel (C-Ni) and carbon-nitride-nickel (CNx-Ni) films were deposited onto native SiO2 covered Si substrates by DC magnetron sputtering from a graphite-nickel composite target using Ar or N 2 for sputtering at about 2.6 Pa. The substrate temperature varied between 25 and 800°C. The structure, composition and mechanical properties of C-Ni and CNx-Ni thin layers (200-300 nm) have been investigated by high-resolution transmission electron microscopy (HRTEM), XPS, nano-indentation and nano-scratch techniques. The layers were predominantly crystalline irrespective of their deposition conditions. At low deposition temperature, up to 200°C, the columnar crystallites were identified as hexagonal Ni3C, separated by narrow 'walls' of amorphous carbon. At substrate temperatures above 400°C, however, a graphitic multilayer arrangement of the carbon matrix was developed around the nano-crystalline cubic nickel - nickel carbide islands. The mechanical properties of the films varied also significantly with the deposition temperature. The highest nano-hardness of about 14 GPa was measured for the film grown at 200°C, while lower values (2-4 GPa) were obtained for high-temperature films. High hardness values were related to the presence of Ni3C. The lowest friction coefficients were obtained for films containing high amounts of multi-layered graphite-like carbon developed at intermediate deposition temperatures.

KW - C-Ni

KW - CN-Ni

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