Composition and thickness of RF sputtered amorphous silicon alloy films

T. Lohner, Miklós Serényi, Dipak K. Basa, Nquyen Quoc Khánh, Ákos Nemcsics, P. Petrik, Péter Turmezei

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Because the composition and the thickness of the thin films are very important for the fabrication of the devices, in this study we have undertaken the determination of the composition and the thickness of the RF sputtered amorphous silicon alloy thin films deposited at room temperature under very different preparation conditions by using various techniques. Incorporation of argon is demonstrated in the room temperature deposited films and the thickness of the films measured by different methods such as Rutherford backscattering, spectroscopicellipsometry and step-profiler are found to be in reasonable agreement with each other.

Original languageEnglish
Pages (from-to)23-30
Number of pages8
JournalActa Polytechnica Hungarica
Volume5
Issue number2
Publication statusPublished - 2008

Fingerprint

Silicon alloys
Amorphous alloys
Amorphous silicon
Thin films
Rutherford backscattering spectroscopy
Chemical analysis
Argon
Fabrication
Temperature

Keywords

  • Amorphous Si alloys
  • Ellipsometry
  • RBS
  • Sputtering

ASJC Scopus subject areas

  • General
  • Engineering(all)

Cite this

Lohner, T., Serényi, M., Basa, D. K., Khánh, N. Q., Nemcsics, Á., Petrik, P., & Turmezei, P. (2008). Composition and thickness of RF sputtered amorphous silicon alloy films. Acta Polytechnica Hungarica, 5(2), 23-30.

Composition and thickness of RF sputtered amorphous silicon alloy films. / Lohner, T.; Serényi, Miklós; Basa, Dipak K.; Khánh, Nquyen Quoc; Nemcsics, Ákos; Petrik, P.; Turmezei, Péter.

In: Acta Polytechnica Hungarica, Vol. 5, No. 2, 2008, p. 23-30.

Research output: Contribution to journalArticle

Lohner, T, Serényi, M, Basa, DK, Khánh, NQ, Nemcsics, Á, Petrik, P & Turmezei, P 2008, 'Composition and thickness of RF sputtered amorphous silicon alloy films', Acta Polytechnica Hungarica, vol. 5, no. 2, pp. 23-30.
Lohner, T. ; Serényi, Miklós ; Basa, Dipak K. ; Khánh, Nquyen Quoc ; Nemcsics, Ákos ; Petrik, P. ; Turmezei, Péter. / Composition and thickness of RF sputtered amorphous silicon alloy films. In: Acta Polytechnica Hungarica. 2008 ; Vol. 5, No. 2. pp. 23-30.
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