Complementary metrology within a European joint laboratory

A. Nutsch, B. Beckhoff, R. Altmann, J. A. Van Den Berg, D. Giubertoni, P. Hoenicke, M. Bersani, A. Leibold, F. Meirer, M. Mueller, G. Pepponi, M. Otto, P. Petrik, M. Reading, L. Pfitzner, H. Ryssel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

13 Citations (Scopus)


The continuous dimensional reduction drives the development of metrology, analysis and characterization for nano and micro electronics. An enormous worldwide R&D effort focuses on the understanding and controlling materials properties and dimensions at atomic level. Crucial for groundbreaking new developments is the availability of appropriate analytical infrastructures providing techniques with information depths well adapted to the nanoscaled objects of interest. This requires widely accessible, independent complementary metrology, analytical techniques, and characterization. For example new materials and the demand of improved detection sensitivities for contaminants provide huge challenges for the capabilities of current analysis equipment and expertise. At the same time, the availability of complementary competences is crucial for advancement of analytical methodologies through cross-comparison, round-robin, and benchmarking of results. This paper describes the formation of an independent analytical infrastructure within Europe having the expertise and competence to solve metrology problems for development of nanotechnologies. Furthermore, a strategy is shown to establish independently operating 'Golden Laboratories'(tm) for complementary and reliable metrology, analysis, and characterization adapted to the requirements of industrial partners.

Original languageEnglish
Title of host publicationUltra Clean Processing of Semiconductor Surfaces IX
Subtitle of host publicationUCPSS 2008
PublisherTrans Tech Publications Ltd
Number of pages4
ISBN (Print)3908451647, 9783908451648
Publication statusPublished - Jan 1 2009
Event9th international symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2008 - Bruges, Belgium
Duration: Sep 22 2008Sep 24 2008

Publication series

NameSolid State Phenomena
ISSN (Print)1012-0394


Other9th international symposium on Ultra Clean Processing of Semiconductor Surfaces, UCPSS 2008



  • Research infrastructures
  • Thin layers
  • Ultra shallow junctions
  • Ultra trace analysis

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

Cite this

Nutsch, A., Beckhoff, B., Altmann, R., Van Den Berg, J. A., Giubertoni, D., Hoenicke, P., Bersani, M., Leibold, A., Meirer, F., Mueller, M., Pepponi, G., Otto, M., Petrik, P., Reading, M., Pfitzner, L., & Ryssel, H. (2009). Complementary metrology within a European joint laboratory. In Ultra Clean Processing of Semiconductor Surfaces IX: UCPSS 2008 (pp. 97-100). (Solid State Phenomena; Vol. 145-146). Trans Tech Publications Ltd.