Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy

P. Petrik, L. Bíró, M. Fried, T. Lohner, R. Berger, C. Schneider, J. Gyulai, H. Ryssel

Research output: Contribution to journalArticle

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Abstract

Polysilicon layers prepared by low-pressure chemical vapor deposition at 560°C, 620°C, 660°C, and 700°C were measured by Atomic Force Microscopy (AFM) and Spectroscopic Ellipsometry (SE). Morphology, cross-sectional profile, roughness spectral density, and roughness of the surfaces were investigated by AFM using window sizes of 1 × 1 μm2, 10 × 10 μm2, and 50 × 50 μm2. The layer structure and the surface roughness were determined by SE using the Bruggemann-Effective Medium Approximation (B-EMA). The Root Mean Square (RMS) and mean square (Ra) roughness values measured by AFM were compared to the thickness of the top layer of the SE model describing the surface roughness. Although AFM results depend on the used window size, good correlation was found between the roughness values determined by AFM and SE for each window sizes. The results show that SE calibrated with AFM could be used for quantitative surface roughness determination.

Original languageEnglish
Pages (from-to)186-191
Number of pages6
JournalThin Solid Films
Volume315
Issue number1-2
Publication statusPublished - Mar 2 1998

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Spectroscopic ellipsometry
Polysilicon
ellipsometry
Atomic force microscopy
surface roughness
Surface roughness
atomic force microscopy
roughness
Low pressure chemical vapor deposition
Spectral density
low pressure
vapor deposition
profiles
approximation

Keywords

  • Deposition
  • Ellipsometry
  • Polysilicon

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy. / Petrik, P.; Bíró, L.; Fried, M.; Lohner, T.; Berger, R.; Schneider, C.; Gyulai, J.; Ryssel, H.

In: Thin Solid Films, Vol. 315, No. 1-2, 02.03.1998, p. 186-191.

Research output: Contribution to journalArticle

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AU - Berger, R.

AU - Schneider, C.

AU - Gyulai, J.

AU - Ryssel, H.

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