CH5 precursor mechanism for diamond growth

I. Pintér, M. Marinelli, A. Tebano, A. Paoletti, P. Paroli

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Deposition rates of polycrystalline diamond films are investigated as a function of concentration of water vapor in a microwave chemical vapor deposition (CVD) apparatus. For CH4:H2 = 2%:98% gas composition the measured deposition rates are compared with mass spectroscopic data published in the literature and predictions suggested by the widely accepted methyl radical (CH3) diamond growth model. Our results do not confirm the CH3 model, but a good correlation is found between the concentration of CH5 + radicals and the deposition rates of diamond. The main reaction paths leading to diamond deposition from CH5 + are also presented.

Original languageEnglish
Pages (from-to)397-402
Number of pages6
JournalPhysica Status Solidi (A) Applied Research
Volume141
Issue number2
Publication statusPublished - Feb 1994

Fingerprint

Diamond
Deposition rates
Diamonds
diamonds
Diamond films
Steam
Water vapor
Chemical vapor deposition
gas composition
Gases
diamond films
Microwaves
water vapor
vapor deposition
Chemical analysis
microwaves
predictions

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Pintér, I., Marinelli, M., Tebano, A., Paoletti, A., & Paroli, P. (1994). CH5 precursor mechanism for diamond growth. Physica Status Solidi (A) Applied Research, 141(2), 397-402.

CH5 precursor mechanism for diamond growth. / Pintér, I.; Marinelli, M.; Tebano, A.; Paoletti, A.; Paroli, P.

In: Physica Status Solidi (A) Applied Research, Vol. 141, No. 2, 02.1994, p. 397-402.

Research output: Contribution to journalArticle

Pintér, I, Marinelli, M, Tebano, A, Paoletti, A & Paroli, P 1994, 'CH5 precursor mechanism for diamond growth', Physica Status Solidi (A) Applied Research, vol. 141, no. 2, pp. 397-402.
Pintér I, Marinelli M, Tebano A, Paoletti A, Paroli P. CH5 precursor mechanism for diamond growth. Physica Status Solidi (A) Applied Research. 1994 Feb;141(2):397-402.
Pintér, I. ; Marinelli, M. ; Tebano, A. ; Paoletti, A. ; Paroli, P. / CH5 precursor mechanism for diamond growth. In: Physica Status Solidi (A) Applied Research. 1994 ; Vol. 141, No. 2. pp. 397-402.
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