Characterization of thin ZnO films by vacuum ultra-violet reflectometry

T. Gumprecht, P. Petrik, G. Roeder, M. Schellenberger, L. Pfitzner, B. Pollakowski, B. Beckhoff

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

ZnO has a huge potential and is already a crucial material in a range of key technologies from photovoltaics to opto and printed electronics. ZnO is being characterized by versatile metrologies to reveal electrical, optical, structural and other parameters with the aim of process optimization for best device performance. The aim of the present work is to reveal the capabilities of vacuum ultra-violet (VUV) reflectometry for the characterization of ZnO films of nominally 50 nm, doped by Ga and In. Optical metrologies have already shown to be able to sensitively measure the gap energy, the exciton strength, the density, the surface nanoroughness and a range of technologically important structural and material parameters. It has also been shown that these optical properties closely correlate with the most important electrical properties like the carrier density and hence the specific resistance of the film. We show that VUV reflectometry is a highly sensitive optical method that is capable of the characterization of crucial film properties. Our results have been cross-checked by reference methods such as ellipsometry and X-ray fluorescence.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages65-70
Number of pages6
Volume1494
DOIs
Publication statusPublished - 2013
Event2012 MRS Fall Meeting - Boston, MA, United States
Duration: Nov 25 2012Nov 30 2012

Other

Other2012 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period11/25/1211/30/12

Fingerprint

Vacuum
Thin films
vacuum
metrology
thin films
Ellipsometry
Excitons
ellipsometry
Carrier concentration
Electric properties
Energy gap
Electronic equipment
Optical properties
Fluorescence
electrical properties
excitons
optics
optical properties
X rays
fluorescence

Keywords

  • Atomic layer deposition
  • Spectroscopic ellipsometry
  • Vacuum ultra-violet reflectometry
  • Zink oxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering
  • Mechanics of Materials

Cite this

Gumprecht, T., Petrik, P., Roeder, G., Schellenberger, M., Pfitzner, L., Pollakowski, B., & Beckhoff, B. (2013). Characterization of thin ZnO films by vacuum ultra-violet reflectometry. In Materials Research Society Symposium Proceedings (Vol. 1494, pp. 65-70) https://doi.org/10.1557/opl.2012.1677

Characterization of thin ZnO films by vacuum ultra-violet reflectometry. / Gumprecht, T.; Petrik, P.; Roeder, G.; Schellenberger, M.; Pfitzner, L.; Pollakowski, B.; Beckhoff, B.

Materials Research Society Symposium Proceedings. Vol. 1494 2013. p. 65-70.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Gumprecht, T, Petrik, P, Roeder, G, Schellenberger, M, Pfitzner, L, Pollakowski, B & Beckhoff, B 2013, Characterization of thin ZnO films by vacuum ultra-violet reflectometry. in Materials Research Society Symposium Proceedings. vol. 1494, pp. 65-70, 2012 MRS Fall Meeting, Boston, MA, United States, 11/25/12. https://doi.org/10.1557/opl.2012.1677
Gumprecht T, Petrik P, Roeder G, Schellenberger M, Pfitzner L, Pollakowski B et al. Characterization of thin ZnO films by vacuum ultra-violet reflectometry. In Materials Research Society Symposium Proceedings. Vol. 1494. 2013. p. 65-70 https://doi.org/10.1557/opl.2012.1677
Gumprecht, T. ; Petrik, P. ; Roeder, G. ; Schellenberger, M. ; Pfitzner, L. ; Pollakowski, B. ; Beckhoff, B. / Characterization of thin ZnO films by vacuum ultra-violet reflectometry. Materials Research Society Symposium Proceedings. Vol. 1494 2013. pp. 65-70
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