Characterization of sputtered and annealed niobium oxide films using spectroscopic ellipsometry, Rutherford backscattering spectrometry and X-ray diffraction

M. Serényi, T. Lohner, P. Petrik, Z. Zolnai, Z. Horváth, N. Q. Khánh

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

Niobium oxide films were prepared by radio frequency sputtering using Nb2O5 crystalline powder. The thickness and the complex dielectric functions of the as-prepared films were determined by spectroscopic ellipsometry using the Tauc-Lorentz oscillator model. The as-deposited films were amorphous, their refractive index varies between 2.26 and 2.30 at wavelength of 550 nm and the optical band gap varies between 3.29 and 3.46 eV depending on the sputtering conditions. The composition of the layers was studied using Rutherford backscattering spectrometry with 2 MeV 4He+ ion beam. The Nb/O ratio was found in the close vicinity of the stoichiometric one. The films contained small amount of argon. Annealing in air (500 °C, 24 h) causes crystallization and changes in the refractive index and in the extinction coefficient of the film. The optical properties of the sputtered films were compared with those of layers prepared by plasma enhanced chemical vapor deposition, reactive dc sputtering and low frequency magnetron sputtering in other laboratories.

Original languageEnglish
Pages (from-to)8096-8100
Number of pages5
JournalThin Solid Films
Volume516
Issue number22
DOIs
Publication statusPublished - Sep 30 2008

Fingerprint

Niobium oxide
niobium oxides
Spectroscopic ellipsometry
Rutherford backscattering spectroscopy
Spectrometry
Oxide films
ellipsometry
oxide films
backscattering
X ray diffraction
diffraction
spectroscopy
sputtering
Sputtering
Refractive index
x rays
Argon
Reactive sputtering
refractivity
Optical band gaps

Keywords

  • Ellipsometry
  • Niobium oxide
  • Optical properties
  • Radio frequency sputtering
  • Rutherford backscattering spectrometry
  • X-ray diffraction

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

@article{0407ad14c2b84e5db0295384fca73d7b,
title = "Characterization of sputtered and annealed niobium oxide films using spectroscopic ellipsometry, Rutherford backscattering spectrometry and X-ray diffraction",
abstract = "Niobium oxide films were prepared by radio frequency sputtering using Nb2O5 crystalline powder. The thickness and the complex dielectric functions of the as-prepared films were determined by spectroscopic ellipsometry using the Tauc-Lorentz oscillator model. The as-deposited films were amorphous, their refractive index varies between 2.26 and 2.30 at wavelength of 550 nm and the optical band gap varies between 3.29 and 3.46 eV depending on the sputtering conditions. The composition of the layers was studied using Rutherford backscattering spectrometry with 2 MeV 4He+ ion beam. The Nb/O ratio was found in the close vicinity of the stoichiometric one. The films contained small amount of argon. Annealing in air (500 °C, 24 h) causes crystallization and changes in the refractive index and in the extinction coefficient of the film. The optical properties of the sputtered films were compared with those of layers prepared by plasma enhanced chemical vapor deposition, reactive dc sputtering and low frequency magnetron sputtering in other laboratories.",
keywords = "Ellipsometry, Niobium oxide, Optical properties, Radio frequency sputtering, Rutherford backscattering spectrometry, X-ray diffraction",
author = "M. Ser{\'e}nyi and T. Lohner and P. Petrik and Z. Zolnai and Z. Horv{\'a}th and Kh{\'a}nh, {N. Q.}",
year = "2008",
month = "9",
day = "30",
doi = "10.1016/j.tsf.2008.04.070",
language = "English",
volume = "516",
pages = "8096--8100",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "22",

}

TY - JOUR

T1 - Characterization of sputtered and annealed niobium oxide films using spectroscopic ellipsometry, Rutherford backscattering spectrometry and X-ray diffraction

AU - Serényi, M.

AU - Lohner, T.

AU - Petrik, P.

AU - Zolnai, Z.

AU - Horváth, Z.

AU - Khánh, N. Q.

PY - 2008/9/30

Y1 - 2008/9/30

N2 - Niobium oxide films were prepared by radio frequency sputtering using Nb2O5 crystalline powder. The thickness and the complex dielectric functions of the as-prepared films were determined by spectroscopic ellipsometry using the Tauc-Lorentz oscillator model. The as-deposited films were amorphous, their refractive index varies between 2.26 and 2.30 at wavelength of 550 nm and the optical band gap varies between 3.29 and 3.46 eV depending on the sputtering conditions. The composition of the layers was studied using Rutherford backscattering spectrometry with 2 MeV 4He+ ion beam. The Nb/O ratio was found in the close vicinity of the stoichiometric one. The films contained small amount of argon. Annealing in air (500 °C, 24 h) causes crystallization and changes in the refractive index and in the extinction coefficient of the film. The optical properties of the sputtered films were compared with those of layers prepared by plasma enhanced chemical vapor deposition, reactive dc sputtering and low frequency magnetron sputtering in other laboratories.

AB - Niobium oxide films were prepared by radio frequency sputtering using Nb2O5 crystalline powder. The thickness and the complex dielectric functions of the as-prepared films were determined by spectroscopic ellipsometry using the Tauc-Lorentz oscillator model. The as-deposited films were amorphous, their refractive index varies between 2.26 and 2.30 at wavelength of 550 nm and the optical band gap varies between 3.29 and 3.46 eV depending on the sputtering conditions. The composition of the layers was studied using Rutherford backscattering spectrometry with 2 MeV 4He+ ion beam. The Nb/O ratio was found in the close vicinity of the stoichiometric one. The films contained small amount of argon. Annealing in air (500 °C, 24 h) causes crystallization and changes in the refractive index and in the extinction coefficient of the film. The optical properties of the sputtered films were compared with those of layers prepared by plasma enhanced chemical vapor deposition, reactive dc sputtering and low frequency magnetron sputtering in other laboratories.

KW - Ellipsometry

KW - Niobium oxide

KW - Optical properties

KW - Radio frequency sputtering

KW - Rutherford backscattering spectrometry

KW - X-ray diffraction

UR - http://www.scopus.com/inward/record.url?scp=50649116580&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50649116580&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2008.04.070

DO - 10.1016/j.tsf.2008.04.070

M3 - Article

AN - SCOPUS:50649116580

VL - 516

SP - 8096

EP - 8100

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 22

ER -