Characterization of oblique deposited nanostructured SiOx films by ellipsometric and IR spectroscopies

A. Szekeres, E. Vlaikova, T. Lohner, A. L. Toth, I. Lisovskyy, S. Zlobin, P. E. Shepeliavyi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Studies of oblique deposited nanostructured SiOx films by ellipsometric and IR spectroscopies are presented, as additional information is obtained by scanning electron microscopy (SEM). The films were deposited onto Si substrates under a 75° incidence vapor by vacuum evaporation of SiO and were annealed in Ar at 950°C. The thickness and composition of the films were estimated from the ellipsometric data analysis applying the Bruggeman effective approximation theory. Three-layer optical model described satisfactory the annealed film structure and verified the formation of nanocrystalline Si clusters. SEM micrographs showed that evaporated films consisted of silicon oxide pillars separated by air space and tilted at an angle of ∼57° to Si substrate surface. The thin silica pillars were most probably free from Si-SiO2 interface leading to absence of strong absorption on LO vibrations in the IR spectrum. The estimated porosity factor was ∼62 %. By annealing, the film oxidized to SiO2 but it remained columnar with a porosity factor of ∼47 %.

Original languageEnglish
Title of host publicationNanostructured Materials, Thin Films and Hard Coatings for Advanced Applications
PublisherTrans Tech Publications Ltd
Pages149-152
Number of pages4
ISBN (Print)3908451779, 9783908451778
DOIs
Publication statusPublished - Jan 1 2010
Event2nd International Conference on Nanostructured Materials, Thin Films and Hard Coatings for Advanced Applications, NANOHARD 2009 - Sozopol, Bulgaria
Duration: May 24 2009May 27 2009

Publication series

NameSolid State Phenomena
Volume159
ISSN (Print)1012-0394

Other

Other2nd International Conference on Nanostructured Materials, Thin Films and Hard Coatings for Advanced Applications, NANOHARD 2009
CountryBulgaria
CitySozopol
Period5/24/095/27/09

Keywords

  • Infrared spectroscopy
  • Nano-sized Si clusters
  • Scanning electron microscopy
  • Silicon oxides
  • Spectroscopic ellipsometry
  • Vacuum evaporation

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Materials Science(all)
  • Condensed Matter Physics

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  • Cite this

    Szekeres, A., Vlaikova, E., Lohner, T., Toth, A. L., Lisovskyy, I., Zlobin, S., & Shepeliavyi, P. E. (2010). Characterization of oblique deposited nanostructured SiOx films by ellipsometric and IR spectroscopies. In Nanostructured Materials, Thin Films and Hard Coatings for Advanced Applications (pp. 149-152). (Solid State Phenomena; Vol. 159). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/SSP.159.149