Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique

C. Cserháti, Z. Erdélyi, Z. Balogh, L. Daróczi, A. Csík, G. Langer, M. Varga, I. Zizak, A. Erko, D. Beke

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.

Original languageEnglish
Title of host publicationDefect and Diffusion Forum
Pages369-375
Number of pages7
Volume289-292
DOIs
Publication statusPublished - 2009
Event7th International Conference on Diffusion in Materials - Lanzarote, Spain
Duration: Oct 28 2008Oct 31 2008

Publication series

NameDefect and Diffusion Forum
Volume289-292
ISSN (Print)10120386

Other

Other7th International Conference on Diffusion in Materials
CountrySpain
CityLanzarote
Period10/28/0810/31/08

Fingerprint

standing waves
Intermetallics
intermetallics
X rays
x rays
Sandwich structures
Depth profiling
X ray absorption
sandwich structures
Waveguides
Fluorescence
Annealing
Kinetics
fine structure
waveguides
fluorescence
annealing
kinetics

Keywords

  • Depth profiling
  • EXAFS
  • Nanostructure
  • Solid state reaction
  • X-ray standing wave

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Radiation

Cite this

Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique. / Cserháti, C.; Erdélyi, Z.; Balogh, Z.; Daróczi, L.; Csík, A.; Langer, G.; Varga, M.; Zizak, I.; Erko, A.; Beke, D.

Defect and Diffusion Forum. Vol. 289-292 2009. p. 369-375 (Defect and Diffusion Forum; Vol. 289-292).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cserháti, C, Erdélyi, Z, Balogh, Z, Daróczi, L, Csík, A, Langer, G, Varga, M, Zizak, I, Erko, A & Beke, D 2009, Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique. in Defect and Diffusion Forum. vol. 289-292, Defect and Diffusion Forum, vol. 289-292, pp. 369-375, 7th International Conference on Diffusion in Materials, Lanzarote, Spain, 10/28/08. https://doi.org/10.4028/www.scientific.net/DDF.289-292.369
Cserháti, C. ; Erdélyi, Z. ; Balogh, Z. ; Daróczi, L. ; Csík, A. ; Langer, G. ; Varga, M. ; Zizak, I. ; Erko, A. ; Beke, D. / Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique. Defect and Diffusion Forum. Vol. 289-292 2009. pp. 369-375 (Defect and Diffusion Forum).
@inproceedings{04af01fb02d34c358c41cbd823bc4927,
title = "Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique",
abstract = "X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.",
keywords = "Depth profiling, EXAFS, Nanostructure, Solid state reaction, X-ray standing wave",
author = "C. Cserh{\'a}ti and Z. Erd{\'e}lyi and Z. Balogh and L. Dar{\'o}czi and A. Cs{\'i}k and G. Langer and M. Varga and I. Zizak and A. Erko and D. Beke",
year = "2009",
doi = "10.4028/www.scientific.net/DDF.289-292.369",
language = "English",
isbn = "3908451728",
volume = "289-292",
series = "Defect and Diffusion Forum",
pages = "369--375",
booktitle = "Defect and Diffusion Forum",

}

TY - GEN

T1 - Characterization of intermetallic layer with nanoresolution using X-ray standing wave technique

AU - Cserháti, C.

AU - Erdélyi, Z.

AU - Balogh, Z.

AU - Daróczi, L.

AU - Csík, A.

AU - Langer, G.

AU - Varga, M.

AU - Zizak, I.

AU - Erko, A.

AU - Beke, D.

PY - 2009

Y1 - 2009

N2 - X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.

AB - X-ray standing wave technique has been used to measure the kinetics of CoSi intermetallic phase growth in a-Si/Co/a-Si sandwich structure. The a-Si/Co/a-Si arrangement were placed into a waveguide structure formed by two Ta films. X-ray fluorescence and extended X-ray absorption fine structure analysis has been used in a combination with X-ray standing wave technique for depth profiling with sub-nanometer resolution of specimens annealed at 493K for different annealing time. The position and the thickness of the growing CoSi intermetallic phase have been monitored.

KW - Depth profiling

KW - EXAFS

KW - Nanostructure

KW - Solid state reaction

KW - X-ray standing wave

UR - http://www.scopus.com/inward/record.url?scp=75949129678&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=75949129678&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/DDF.289-292.369

DO - 10.4028/www.scientific.net/DDF.289-292.369

M3 - Conference contribution

SN - 3908451728

SN - 9783908451723

VL - 289-292

T3 - Defect and Diffusion Forum

SP - 369

EP - 375

BT - Defect and Diffusion Forum

ER -