Characterization of excimer lamp photo-deposited ultrathin oxynitride films

S. Lynch, Gerard M. O'Connor, Gabriel M. Crean, J. Y. Zhang, Z. Geretovszky, Philippe Bergonzo, Ian W. Boyd

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Excimer lamp deposited ultra-thin (<250 angstrom) silicon dioxide and silicon oxynitride films were characterized using spectroscopic ellipsometry (SE) and Fourier transform infrared (FTIR) spectroscopy. SE analysis of the photo-deposited SiO2 films revealed no variation in the refractive index (n) of the films for deposition temperatures of 200°C and 300°C. Using a Bruggeman effective medium approximation (EMA), SE analysis was employed to determine both the silicon oxynitride layer thicknesses and compositions as a function of deposition temperatures and gas ratio, defined as (N2O/(N2O + NH3)). From this analysis the optical properties of the silicon oxynitride thin films were extracted. It was observed that the refractive index for the 200°C and 300°C series of samples decreased from n = 1.81 to 1.46 and n = 1.72 to 1.46 respectively as a function of increasing gas flow ratio. FTIR analysis revealed spectral features characteristic of Si-O, Si-N, Si-H and N-H bonding. The most significant feature in all recorded spectra was a mixed spectral absorption band ranging from 800 cm-1 to 1300 cm-1. Both the integrated band area and peak wavenumber of this absorption band was found to be sensitive to the degree of nitridation and layer thickness of the thin films. The N-H stretching bond density was calculated from the N-H peak at 3360 cm-1 using appropriate calibration factors. A slight decrease in the N-H bond density with increasing gas flow rate was observed. This variation in bond density was significantly less than that observed for PECVD silicon oxynitride films.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsJan J. Dubowski
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages302-310
Number of pages9
Volume2403
ISBN (Print)0819417505
Publication statusPublished - 1995
EventLaser-Induced Thin-Film Processing - San Jose, CA, USA
Duration: Feb 8 1995Feb 10 1995

Other

OtherLaser-Induced Thin-Film Processing
CitySan Jose, CA, USA
Period2/8/952/10/95

Fingerprint

Ultrathin films
oxynitrides
excimers
Electric lamps
luminaires
Spectroscopic ellipsometry
ellipsometry
Silicon
silicon
absorption spectra
gas flow
Flow of gases
Absorption spectra
Refractive index
refractivity
Thin films
Nitridation
Plasma enhanced chemical vapor deposition
thin films
Spectrum analysis

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Lynch, S., O'Connor, G. M., Crean, G. M., Zhang, J. Y., Geretovszky, Z., Bergonzo, P., & Boyd, I. W. (1995). Characterization of excimer lamp photo-deposited ultrathin oxynitride films. In J. J. Dubowski (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2403, pp. 302-310). Society of Photo-Optical Instrumentation Engineers.

Characterization of excimer lamp photo-deposited ultrathin oxynitride films. / Lynch, S.; O'Connor, Gerard M.; Crean, Gabriel M.; Zhang, J. Y.; Geretovszky, Z.; Bergonzo, Philippe; Boyd, Ian W.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Jan J. Dubowski. Vol. 2403 Society of Photo-Optical Instrumentation Engineers, 1995. p. 302-310.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lynch, S, O'Connor, GM, Crean, GM, Zhang, JY, Geretovszky, Z, Bergonzo, P & Boyd, IW 1995, Characterization of excimer lamp photo-deposited ultrathin oxynitride films. in JJ Dubowski (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2403, Society of Photo-Optical Instrumentation Engineers, pp. 302-310, Laser-Induced Thin-Film Processing, San Jose, CA, USA, 2/8/95.
Lynch S, O'Connor GM, Crean GM, Zhang JY, Geretovszky Z, Bergonzo P et al. Characterization of excimer lamp photo-deposited ultrathin oxynitride films. In Dubowski JJ, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2403. Society of Photo-Optical Instrumentation Engineers. 1995. p. 302-310
Lynch, S. ; O'Connor, Gerard M. ; Crean, Gabriel M. ; Zhang, J. Y. ; Geretovszky, Z. ; Bergonzo, Philippe ; Boyd, Ian W. / Characterization of excimer lamp photo-deposited ultrathin oxynitride films. Proceedings of SPIE - The International Society for Optical Engineering. editor / Jan J. Dubowski. Vol. 2403 Society of Photo-Optical Instrumentation Engineers, 1995. pp. 302-310
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