CCl 4 decomposition in rf thermal plasma in inert and oxidative environments

Tamás Kovács, T. Turányi, J. Szépvölgyi

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The decomposition of carbon tetrachloride was investigated in an RF induc tively coupled thermal plasma reactor in inert CCl 4-Ar and in oxidative CCl 4-O 2-Ar systems, respectively. The exhaust gases were analyzed by gas chromatography-mass spectrometry. The kinetics of CCl 4 decomposition at the experimental conditions was modeled in the temperature range of 300-7,000 K. The simulations predicted 67.0 and 97.9% net conversions of CCl 4 for CCl 4-Ar and for CCl 4-O 2-Ar, respectively. These values are close to the experimentally determined values of 60.6 and 92.5%. We concluded that in RF thermal plasma much less CCl 4 reconstructed in oxidative environment than in an oxygen-free mixture.

Original languageEnglish
Pages (from-to)281-286
Number of pages6
JournalPlasma Chemistry and Plasma Processing
Volume30
Issue number2
DOIs
Publication statusPublished - Apr 2010

Fingerprint

Plasma Gases
thermal plasmas
Decomposition
Plasmas
decomposition
Carbon tetrachloride
exhaust gases
Carbon Tetrachloride
carbon tetrachloride
gas chromatography
Exhaust gases
Gas chromatography
Mass spectrometry
mass spectroscopy
reactors
Oxygen
Kinetics
kinetics
oxygen
simulation

Keywords

  • Carbon tetrachloride
  • Decomposition
  • Thermal plasma

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

CCl 4 decomposition in rf thermal plasma in inert and oxidative environments. / Kovács, Tamás; Turányi, T.; Szépvölgyi, J.

In: Plasma Chemistry and Plasma Processing, Vol. 30, No. 2, 04.2010, p. 281-286.

Research output: Contribution to journalArticle

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