Carbon nano-particles prepared by ion-clustering in plasma

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The plasma-assisted chemical vapour deposition technique was used to produce carbon nano-particles in a dusty plasma condition, at increased gas pressure and decreased electric field. The negatively biased upper electrode levitates the forming carbon clusters, which grow in a spherical symmetrical way in the relatively large density of the ions of the plasma. The spheres also attach to each other, but their concentration and mobility being low, the aggregation results in a different structure: a necklace-type chain will be formed. The dust particles, leaving the plasma cover the chamber wall, but a substantial amount of them reach the electrically driven substrate; forming an amorphous carbon film. The cluster systems were investigated by transmission electron microscopy, atomic force microscopy, Raman, infrared and photoluminescence spectroscopic methods.

Original languageEnglish
Pages (from-to)171-176
Number of pages6
JournalVacuum
Volume71
Issue number1-2 SPEC.
DOIs
Publication statusPublished - May 9 2003

Fingerprint

Carbon
Ions
Plasmas
carbon
ions
dusty plasmas
Carbon clusters
gas pressure
Carbon films
Amorphous carbon
Amorphous films
dust
chambers
vapor deposition
atomic force microscopy
Particles (particulate matter)
Dust
photoluminescence
Chemical vapor deposition
Atomic force microscopy

Keywords

  • Clustering
  • Dusty plasma
  • Hydrogenated amorphous carbon
  • Nano-particles

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Carbon nano-particles prepared by ion-clustering in plasma. / Pócsik, I.; Veres, M.; Füle, M.; Koós, M.; Kokavecz, J.; Tóth, Z.; Radnóczi, G.

In: Vacuum, Vol. 71, No. 1-2 SPEC., 09.05.2003, p. 171-176.

Research output: Contribution to journalArticle

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AU - Radnóczi, G.

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