Calibration of SIMS measurements by ion implantation

J. Gyulai, F. Pavlyak, I. Krafcsik, A. Solyom, P. Riedl, L. Bori

Research output: Contribution to journalArticle

Abstract

The paper reviews some joint results of the above institutions in quantitative SIMS (Secondary Ion Mass Spectrometry) analysis of implanted dopants. Quantification of the SIMS was achieved by implanting marker ions as standards prior to analysis. Feasibility of this technique was first demonstrated by Giber et al. (1982). Further considerations will be presented.

Original languageEnglish
Pages (from-to)81-86
Number of pages6
JournalPeriodica Polytechnica Chemical Engineering
Volume34
Issue number1-3
Publication statusPublished - Jan 1 1990

ASJC Scopus subject areas

  • Chemical Engineering(all)

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    Gyulai, J., Pavlyak, F., Krafcsik, I., Solyom, A., Riedl, P., & Bori, L. (1990). Calibration of SIMS measurements by ion implantation. Periodica Polytechnica Chemical Engineering, 34(1-3), 81-86.