Behavior of fused silica irradiated by low level 193nm excimer laser for tens of billions of pulses

C. K. Van Peski, Z. Bor, T. Embree, R. Morton

Research output: Contribution to journalArticle

4 Citations (Scopus)


Fused silica samples from six suppliers were irradiated with a range of fluences (0.004mJ/cm2 to 0.2mJ/cm2) using an ArF 193nm Excimer laser. The test was performed in an effort to determine fluence level dependency of induced wavefront distortion and birefringence. Each sample was irradiated with four beams of different fluence levels for 22 billion pulses over a period of 133 days. Wavefront distortion in the irradiated areas was observed for all samples. The sign and magnitude of the distortion were dependent upon the fluence level and the particular sample under irradiation. Birefringence measurements were also made. The birefringence characteristic varied among the samples, possibly as a function of fluence level and material. FTIR spectrum measurements were made and were correlated with wavefront distortion measurements. A description of the test and measurements is presented along with data covering a pulse count of 22 billion pulses.

Original languageEnglish
Pages (from-to)177-186
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
Issue number1
Publication statusPublished - Apr 12 2001

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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