Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films

I. Beszeda, I. Szabó, E. G. Gontier-Moya

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Morphological evolution of thin metallic films, i.e. beading, Ostwald-ripening and/or evaporation of a beaded film, on a substrate under annealing is a complex process which depends on several parameters. However, under accurate experimental conditions, it is possible to study the growth of voids in thin continuous films (beading) separately. We compared different models describing this process and found that the Brandon and Bradshaw's description can be applied for these measurements. They suggest that the voids grow by surface self-diffusion of the metal atoms, independently of the substrate. Hence, from the time dependence of the uncovered surface, which is proportional to the area of voids, the surface self-diffusion coefficient of the metal can be derived. We present here a new method, based on Auger electron spectroscopy and atomic force microscopy techniques, to perform these measurements and we discuss its advantages and limits on an experimental example.

Original languageEnglish
Pages (from-to)787-791
Number of pages5
JournalApplied Surface Science
Volume212-213
Issue numberSPEC.
DOIs
Publication statusPublished - May 15 2003

Fingerprint

Auger electron spectroscopy
surface diffusion
Auger spectroscopy
electron spectroscopy
voids
diffusion coefficient
thin films
Metals
Ostwald ripening
Metallic films
Substrates
metals
time dependence
Atomic force microscopy
Evaporation
evaporation
atomic force microscopy
Annealing
Thin films
Atoms

Keywords

  • Auger electron spectroscopy
  • Surface diffusion
  • Surface topography
  • Thin films

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films. / Beszeda, I.; Szabó, I.; Gontier-Moya, E. G.

In: Applied Surface Science, Vol. 212-213, No. SPEC., 15.05.2003, p. 787-791.

Research output: Contribution to journalArticle

@article{491aaf0d08e940e883e458c3b222a3ad,
title = "Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films",
abstract = "Morphological evolution of thin metallic films, i.e. beading, Ostwald-ripening and/or evaporation of a beaded film, on a substrate under annealing is a complex process which depends on several parameters. However, under accurate experimental conditions, it is possible to study the growth of voids in thin continuous films (beading) separately. We compared different models describing this process and found that the Brandon and Bradshaw's description can be applied for these measurements. They suggest that the voids grow by surface self-diffusion of the metal atoms, independently of the substrate. Hence, from the time dependence of the uncovered surface, which is proportional to the area of voids, the surface self-diffusion coefficient of the metal can be derived. We present here a new method, based on Auger electron spectroscopy and atomic force microscopy techniques, to perform these measurements and we discuss its advantages and limits on an experimental example.",
keywords = "Auger electron spectroscopy, Surface diffusion, Surface topography, Thin films",
author = "I. Beszeda and I. Szab{\'o} and Gontier-Moya, {E. G.}",
year = "2003",
month = "5",
day = "15",
doi = "10.1016/S0169-4332(03)00109-0",
language = "English",
volume = "212-213",
pages = "787--791",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",
number = "SPEC.",

}

TY - JOUR

T1 - Auger electron spectroscopy determination of surface self-diffusion coefficients from growth of voids in thin deposited films

AU - Beszeda, I.

AU - Szabó, I.

AU - Gontier-Moya, E. G.

PY - 2003/5/15

Y1 - 2003/5/15

N2 - Morphological evolution of thin metallic films, i.e. beading, Ostwald-ripening and/or evaporation of a beaded film, on a substrate under annealing is a complex process which depends on several parameters. However, under accurate experimental conditions, it is possible to study the growth of voids in thin continuous films (beading) separately. We compared different models describing this process and found that the Brandon and Bradshaw's description can be applied for these measurements. They suggest that the voids grow by surface self-diffusion of the metal atoms, independently of the substrate. Hence, from the time dependence of the uncovered surface, which is proportional to the area of voids, the surface self-diffusion coefficient of the metal can be derived. We present here a new method, based on Auger electron spectroscopy and atomic force microscopy techniques, to perform these measurements and we discuss its advantages and limits on an experimental example.

AB - Morphological evolution of thin metallic films, i.e. beading, Ostwald-ripening and/or evaporation of a beaded film, on a substrate under annealing is a complex process which depends on several parameters. However, under accurate experimental conditions, it is possible to study the growth of voids in thin continuous films (beading) separately. We compared different models describing this process and found that the Brandon and Bradshaw's description can be applied for these measurements. They suggest that the voids grow by surface self-diffusion of the metal atoms, independently of the substrate. Hence, from the time dependence of the uncovered surface, which is proportional to the area of voids, the surface self-diffusion coefficient of the metal can be derived. We present here a new method, based on Auger electron spectroscopy and atomic force microscopy techniques, to perform these measurements and we discuss its advantages and limits on an experimental example.

KW - Auger electron spectroscopy

KW - Surface diffusion

KW - Surface topography

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=17544385784&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17544385784&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(03)00109-0

DO - 10.1016/S0169-4332(03)00109-0

M3 - Article

AN - SCOPUS:17544385784

VL - 212-213

SP - 787

EP - 791

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

IS - SPEC.

ER -