Atypical characteristics of KrF excimer laser ablation of indium-tin oxide films

T. Szörényi, Z. Kántor, L. D. Laude

Research output: Contribution to journalArticle

35 Citations (Scopus)

Abstract

Indium-tin oxide films possess ablation characteristics which are a function of the film thickness. For 70 and 160 nm thicknesses, low-fluence single pulses are sufficient to remove from the support the solid phase oxide film over the whole illuminated area. Processing under such conditions offers a rather convenient means for large-area "clean" surface patterning, which is, however, limited at high fluences by the onset of melting. At fluences higher than this onset, layer-by-layer ablation via evaporation sets in. For thicker films, only ablation via evaporation is possible. These experimental findings are interpreted in the framework of a thermal model which is supported by appropriate numerical calculations of the temperature distribution in these films.

Original languageEnglish
Pages (from-to)219-222
Number of pages4
JournalApplied Surface Science
Volume86
Issue number1-4
DOIs
Publication statusPublished - 1995

Fingerprint

Excimer lasers
Laser ablation
Ablation
Tin oxides
excimer lasers
indium oxides
Indium
tin oxides
laser ablation
ablation
Oxide films
oxide films
fluence
Evaporation
evaporation
Thick films
thick films
Film thickness
solid phases
Melting

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physical and Theoretical Chemistry
  • Condensed Matter Physics

Cite this

Atypical characteristics of KrF excimer laser ablation of indium-tin oxide films. / Szörényi, T.; Kántor, Z.; Laude, L. D.

In: Applied Surface Science, Vol. 86, No. 1-4, 1995, p. 219-222.

Research output: Contribution to journalArticle

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