Atomic force microscopic characterization of films grown by inverse pulsed laser deposition

L. Égerházi, Zs Geretovszky, T. Csákó, T. Szörényi

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9 Citations (Scopus)


Carbon nitride films have been deposited by KrF excimer laser ablation of a rotating graphite target in 5 Pa nitrogen ambient in an inverse pulsed laser deposition configuration, where the backward motion of the ablated species is utilised for film growth on substrates lying in the target plane. Topometric AFM scans of the films, exhibiting elliptical thickness distribution, have been recorded along the axes of symmetry of the deposition area. High resolution AFM scans revealed the existence of disk-like, or somewhat elongated rice-like features of 5-10 nm average thickness and ∼100 nm largest dimension, densely packed over the whole, approximately 14 × 10 cm 2 deposition area. The RMS roughness of the film decreased from 9 nm near to the laser spot down to 2 nm in the outer regions. Even the highest RMS value obtained for IPLD films was less than half of the typical, 25 nm roughness measured on simultaneously deposited PLD films.

Original languageEnglish
Pages (from-to)4661-4666
Number of pages6
JournalApplied Surface Science
Issue number13 SPEC. ISS.
Publication statusPublished - Apr 30 2006



  • Atomic force microscopic characterization
  • Carbon nitride films
  • Film nanostructure
  • Particulates
  • Pulsed laser deposition

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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