Ar+ laser-induced forward transfer (LIFT): a novel method for micrometer-size surface patterning

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Abstract

As a result of a systematic study on laser-induced forward transfer of tungsten (W) thin films by a focused Ar+ laser (λ=514 nm, 2w0=3μm), it is shown that deposition of 2-3μm diameter W spots of 100 nm thickness and 100% coverage is attainable at low processing powers (50-100 mW).

Original languageEnglish
Pages (from-to)317-320
Number of pages4
JournalApplied Surface Science
Volume69
Issue number1-4
DOIs
Publication statusPublished - May 2 1993

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micrometers
Tungsten
Lasers
lasers
tungsten
Thin films
thin films
Processing

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

Cite this

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title = "Ar+ laser-induced forward transfer (LIFT): a novel method for micrometer-size surface patterning",
abstract = "As a result of a systematic study on laser-induced forward transfer of tungsten (W) thin films by a focused Ar+ laser (λ=514 nm, 2w0=3μm), it is shown that deposition of 2-3μm diameter W spots of 100 nm thickness and 100{\%} coverage is attainable at low processing powers (50-100 mW).",
author = "Z. T{\'o}th and T. Sz{\"o}r{\'e}nyi and A. T{\'o}th",
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