Application of the Sunna dosimeter film in gamma and electron beam radiation processing

A. Kovacs, M. Baranyai, L. Wojnarovits, W. L. McLaughlin, S. D. Miller, A. Miller, P. G. Fuochi, M. Lavalle, I. Slezsak

Research output: Contribution to journalConference article

19 Citations (Scopus)


The OSL (optically stimulated luminescence) based Sunna film containing a microcrystalline dispersion of LiF in a polymer matrix has been recently introduced for high-dose dosimetry. Our previous investigations revealed the applicability of the system in the dose range of 0.01-100 kGy, but irradiation temperature and dose rate effects above 5 kGy reduced its usefulness. The recent discovery of the use of spectrophotometric analysis in the UV range for measuring doses above 5 kGy is a suitable option, while the OSL analysis can be applied for measuring lower doses due to the lack of temperature effect on the response of the film below 1 kGy. The film can be applied both in gamma and electron fields, although its response to the two types of radiation is somewhat different. No significant effects of UV light and humidity have been found, and effects of irradiation temperature are only significant in the case of OSL analysis for doses above 5 kGy. The applicability of two types of Sunna films in electron and gamma radiation processing is discussed in the paper. Copyright (C) 2000 Elsevier Science Ltd.

Original languageEnglish
Pages (from-to)691-695
Number of pages5
JournalRadiation Physics and Chemistry
Issue number3-6
Publication statusPublished - Mar 1 2000
Event11th International Meeting on Radiation Processing (IMRP-11) - Melbourne, Aust
Duration: Mar 14 1999Mar 19 1999


  • Dosimetry
  • Fluorimetry
  • Radiation processing
  • Spectrophotometry

ASJC Scopus subject areas

  • Radiation

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    Kovacs, A., Baranyai, M., Wojnarovits, L., McLaughlin, W. L., Miller, S. D., Miller, A., Fuochi, P. G., Lavalle, M., & Slezsak, I. (2000). Application of the Sunna dosimeter film in gamma and electron beam radiation processing. Radiation Physics and Chemistry, 57(3-6), 691-695.