An integrated CAD framework linking VLSI layout editors and process simulators

Chaitali Sengupta, Miklós Erdélyi, Z. Bor, Joseph R. Cavallaro, Michael C. Smayling, Gábor Szabó, Frank K. Tittel, William L. Wilson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifted masks for photolithography, will be needed. Under these conditions, the only means for the circuit designer to design compact and efficient circuits with good yield capabilities is to be able to see the effect of different design approaches on manufactured silicon, instead of solely relying on conservative general design rules. The Integrated CAD Framework accomplishes this by providing a link between a layout editor (Magic), advanced photolithographic techniques such as phase shifted masks, and a process simulator (Depict). This paper discusses some applications of this tool. A non-conventional process technique involving interferometric phase shifting and off-axis illumination has been evaluated using the tool. Also, a feature of the CAD Framework which allows representation of a phase shifted mask, together with its layout analysis capability has been used to compact a piece of layout by inserting phase shifted elements into it.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsG.E. Fuller
Pages244-252
Number of pages9
Volume2726
DOIs
Publication statusPublished - 1996
EventOptical Microlithography IX - Santa Clara, CA, United States
Duration: Mar 13 1996Mar 15 1996

Other

OtherOptical Microlithography IX
CountryUnited States
CitySanta Clara, CA
Period3/13/963/15/96

Fingerprint

very large scale integration
computer aided design
layouts
simulators
Masks
Computer aided design
masks
Simulators
Networks (circuits)
VLSI circuits
Photolithography
photolithography
Lighting
illumination
Silicon
silicon

Keywords

  • CAD Framework
  • Critical features
  • Photolithographic simulations

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Sengupta, C., Erdélyi, M., Bor, Z., Cavallaro, J. R., Smayling, M. C., Szabó, G., ... Wilson, W. L. (1996). An integrated CAD framework linking VLSI layout editors and process simulators. In G. E. Fuller (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 2726, pp. 244-252) https://doi.org/10.1117/12.240955

An integrated CAD framework linking VLSI layout editors and process simulators. / Sengupta, Chaitali; Erdélyi, Miklós; Bor, Z.; Cavallaro, Joseph R.; Smayling, Michael C.; Szabó, Gábor; Tittel, Frank K.; Wilson, William L.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / G.E. Fuller. Vol. 2726 1996. p. 244-252.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sengupta, C, Erdélyi, M, Bor, Z, Cavallaro, JR, Smayling, MC, Szabó, G, Tittel, FK & Wilson, WL 1996, An integrated CAD framework linking VLSI layout editors and process simulators. in GE Fuller (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 2726, pp. 244-252, Optical Microlithography IX, Santa Clara, CA, United States, 3/13/96. https://doi.org/10.1117/12.240955
Sengupta C, Erdélyi M, Bor Z, Cavallaro JR, Smayling MC, Szabó G et al. An integrated CAD framework linking VLSI layout editors and process simulators. In Fuller GE, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2726. 1996. p. 244-252 https://doi.org/10.1117/12.240955
Sengupta, Chaitali ; Erdélyi, Miklós ; Bor, Z. ; Cavallaro, Joseph R. ; Smayling, Michael C. ; Szabó, Gábor ; Tittel, Frank K. ; Wilson, William L. / An integrated CAD framework linking VLSI layout editors and process simulators. Proceedings of SPIE - The International Society for Optical Engineering. editor / G.E. Fuller. Vol. 2726 1996. pp. 244-252
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