An integrated CAD framework linking VLSI layout editors and process simulators

Chaitali Sengupta, Miklós Erdélyi, Zsolt Bor, Joseph R. Cavallaro, Michael C. Smayling, Gábor Szabó, Frank K. Tittel, William L. Wilson

Research output: Contribution to journalConference article

1 Citation (Scopus)

Abstract

As feature sizes in VLSI circuits extend into the far sub-micron range, new process techniques, such as using phase shifted masks for photolithography, will be needed. Under these conditions, the only means for the circuit designer to design compact and efficient circuits with good yield capabilities is to be able to see the effect of different design approaches on manufactured silicon, instead of solely relying on conservative general design rules. The Integrated CAD Framework accomplishes this by providing a link between a layout editor (Magic), advanced photolithographic techniques such as phase shifted masks, and a process simulator (Depict). This paper discusses some applications of this tool. A non-conventional process technique involving interferometric phase shifting and off-axis illumination has been evaluated using the tool. Also, a feature of the CAD Framework which allows representation of a phase shifted mask, together with its layout analysis capability has been used to compact a piece of layout by inserting phase shifted elements into it.

Original languageEnglish
Pages (from-to)244-252
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2726
DOIs
Publication statusPublished - Dec 1 1996
EventOptical Microlithography IX - Santa Clara, CA, United States
Duration: Mar 13 1996Mar 15 1996

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Keywords

  • CAD Framework
  • Critical features
  • Photolithographic simulations

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Sengupta, C., Erdélyi, M., Bor, Z., Cavallaro, J. R., Smayling, M. C., Szabó, G., Tittel, F. K., & Wilson, W. L. (1996). An integrated CAD framework linking VLSI layout editors and process simulators. Proceedings of SPIE - The International Society for Optical Engineering, 2726, 244-252. https://doi.org/10.1117/12.240955