Amorphous carbon nitride films: Structure and electrical properties

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Abstract

The effect of deposition temperature and N2 gas partial pressure on the morphology, structure, composition and electrical properties of CNx thin films was studied by HRTEM, EDS, STM and STS. Morphology ranging from homogeneous layers through spherical or cylindrical particles embedded into the films to low density globular deposit of CNx was observed as a function of the applied N2 gas pressure. The N-composition was found between 1-20% and the structure varied from amorphous through fulleren-like to nanocrystalline diamond composed with amorphous CNx depending on the temperature and the plasma parameters. * Presented at the Workshop on Solid State Surfaces and Interfaces II, Bratislava, Slovakia, June 20-22, 2000.

Original languageEnglish
Pages (from-to)679-684
Number of pages6
JournalActa Physica Slovaca
Volume50
Issue number6
Publication statusPublished - Dec 1 2000

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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