This paper presents the manufacturing technology of a new semitransparent solar cell that can be used for building integrated applications. Diluted tetramethylammonium hydroxide and isopropyl alcohol mixture is used to create uniform and reproducible pyramidal textures on the silicon wafers, thus reducing surface reflectance. Arbitrary pattern of holes can be etched using 5 wt % tetramethylammonium hydroxide solution. Ammonium persulfate powder has to be dissolved in the bulk etchant in order to maintain a stable 1.34 μm/min etching rate over the 3.5 h etching process. The ARC layer is the 90 nm thick silicon dioxide remaining after the anisotropic etching. The efficiency of the semitransparent solar cell is 6.12 % including grid contact and silicon through-hole areas, the transparency reached is 6.7 %, weighted surface reflectance is 4.31 %.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Hardware and Architecture
- Electrical and Electronic Engineering