AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces

J. Mizsei, V. Lantto

Research output: Chapter in Book/Report/Conference proceedingChapter

4 Citations (Scopus)

Abstract

The most popular supported catalysts in semiconductor gas sensors are noble metals such as Pd, Ag, Au and Pt which are used in order to increase both the selectivity and sensitivity of sensors. The mechanism responsible for changes in the conductance of the semiconductor support due to reactions on the catalyst is in many cases Fermi energy control. The gas changes the Fermi energy of the catalyst and the Fermi level of the semiconductor equilibrates with that of the catalyst. This, in turn, means a well-controlled dispersion of the catalyst particles on the semiconductor support. Here we study the agglomeration properties of ultra-thin sputtered noble metal layers on oxide semiconductor surfaces during annealing up to 400 °C. Ag, Au and Pd layers were sputtered on tin-dioxide thin-film surfaces and AFM (Atomic Force Microscopy) was used to study the agglomeration properties of the layers. Obtained results show that this new tool for the surface research is also very useful in the study of diffusion and agglomeration properties of noble metals on oxidic semiconductor surfaces.

Original languageEnglish
Title of host publicationPhysica Scripta T
Pages233-236
Number of pages4
Volume69
Publication statusPublished - 1997

Fingerprint

dioxides
tin
deposits
atomic force microscopy
catalysts
agglomeration
noble metals
metals
sensors
gases
selectivity
annealing
oxides
energy
sensitivity
thin films

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Mizsei, J., & Lantto, V. (1997). AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces. In Physica Scripta T (Vol. 69, pp. 233-236)

AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces. / Mizsei, J.; Lantto, V.

Physica Scripta T. Vol. 69 1997. p. 233-236.

Research output: Chapter in Book/Report/Conference proceedingChapter

Mizsei, J & Lantto, V 1997, AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces. in Physica Scripta T. vol. 69, pp. 233-236.
Mizsei J, Lantto V. AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces. In Physica Scripta T. Vol. 69. 1997. p. 233-236
Mizsei, J. ; Lantto, V. / AFM studies of ultra-thin metal deposits on sputtered tin-dioxide surfaces. Physica Scripta T. Vol. 69 1997. pp. 233-236
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